SCHEMBL330048

SCHEMBL330048

CO[Si](CCc1ccncc1)(OC)OC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 2/20 0.46
ALDH1A1 P00352 4/20 0.46
KDM4E B2RXH2 3/20 0.46
HRH1 P35367 2/20 0.41
GLA P06280 1/20 0.39
LMNA P02545 1/20 0.39
PGK1 P00558 1/20 0.39
GAA P10253 1/20 0.39
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
HRH3 Q9Y5N1 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
POLB P06746 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
HSD17B10 Q99714 1/20 0.38
NPC1 O15118 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3908852 0.88 HRH1 (0.47) LOXL2ALDH1A1KDM4EHRH1GLA
SCHEMBL139733 0.86 TAAR1 (0.43) KDM4ELMNASMN1; SMN2
SCHEMBL14012101 0.85 LOXL2 (0.38) LOXL2ALDH1A1KDM4EHRH1LMNA
SCHEMBL4291669 0.84 TAAR1 (0.41) KDM4ESMN1; SMN2
SCHEMBL16728270 0.81 LOXL2 (0.45) LOXL2ALDH1A1KDM4EHRH1TDP1
SCHEMBL3921252 0.81 LOXL2 (0.45) LOXL2ALDH1A1KDM4EHRH1TDP1
SCHEMBL106416 0.80 TDP1 (0.46) LOXL2ALDH1A1GAATDP1SMN1; SMN2
SCHEMBL27094924 0.80 MAOB (0.48) HRH3SMN1; SMN2
SCHEMBL329529 0.79 LOXL2 (0.43) LOXL2ALDH1A1KDM4EHRH1LMNA
SCHEMBL16352360 0.79 ALDH1A1 (0.48) LOXL2ALDH1A1KDM4ELMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118616477-B Ecological restoration soil cultivation method 四川亿欣新材料有限公司 2025-06-17 CN disclosed
CN-118616477-A Ecological restoration soil cultivation method 四川亿欣新材料有限公司 2024-09-10 CN disclosed
EP-2407507-B1 RUBBER COMPOSITION AND PNEUMATIC TIRE JSR CORP (JP) 2016-09-28 EP disclosed
CN-104927879-A LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE JSR CORP 2015-09-23 CN disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-20150099414-A1 ORGANOSILICON COMPOUND, MAKING METHOD, ADHESIVE COMPOSITION, AND ARTICLE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-09 US disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
CN-101641767-B Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device FUJITSU LTD 2013-10-30 CN disclosed
US-8361700-B2 Lithographic printing plate precursor and method of preparing lithographic printing plate FUJIFILM CORPORATION (JP) 2013-01-29 US disclosed
EP-2407507-A1 RUBBER COMPOSITION AND PNEUMATIC TIRE JSR Corporation (JP) 2012-01-18 EP disclosed
US-20110319519-A1 RUBBER COMPOSITION AND PNEUMATIC TIRE JSR CORPORATION (JP) 2011-12-29 US disclosed
US-8021753-B2 Film having alternating monolayers of a metal-metal bonded complex monolayer and an organic monolayer by layer-by-layer growth INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-09-20 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-20090277559-A1 METHOD FOR VULCANIZATION-ADHERING RUBBER COMPOSITION TO ADHERENT OF BRASS OR PLATED WITH BRASS, REINFORCING MEMBER FOR RUBBER ARTICLE, RUBBER-REINFORCING MEMBER COMPOSITE AND PNEUMATIC TIRE BRIDGESTONE CORPORATION (JP) 2009-11-12 US disclosed
EP-1840158-B1 METHOD FOR VULCANIZATION AND ADHESION OF RUBBER COMPOSITION WITH ARTICLE TO BE ADHERED BEING MADE OF BRASS OR PLATED WITH BRASS, REINFORCING MATERIAL FOR RUBBER ARTICLE, RUBBER-REINFORCING MATERIAL COMPOSITE, AND PNEUMATIC TIRE BRIDGESTONE CORP (JP) 2009-02-18 EP disclosed
US-20080241740-A1 Support with photosensitive layer; reduce contact angle of water drops FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
EP-1840158-A1 METHOD FOR VULCANIZATION AND ADHESION OF RUBBER COMPOSITION WITH ARTICLE TO BE ADHERED BEING MADE OF BRASS OR PLATED WITH BRASS, REINFORCING MATERIAL FOR RUBBER ARTICLE, RUBBER-REINFORCING MATERIAL COMPOSITE, AND PNEUMATIC TIRE Bridgestone Corporation (JP) 2007-10-03 EP disclosed
US-7189433-B2 Process for preparing a film having alternatively monolayers of a metal-metal bonded complex monolayer and an organic monolayer by layer-by layer growth INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-03-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150099414-A1 ORGANOSILICON COMPOUND, MAKING METHOD, ADHESIVE COMPOSITION, AND ARTICLE EPCAM, SI, ILK LOXL2 432/4885ALDH1A1 128/4885KDM4E 641/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.