Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL6889357 | 0.87 | — | — | |
| Potassium Ion SCHEMBL7893963 | 0.82 | — | — | |
| Potassium Ion SCHEMBL1314220 | 0.82 | CA4 (0.33) | — | |
| Potassium Ion SCHEMBL157015 | 0.82 | — | — | |
| Water SCHEMBL509801 | 0.82 | — | — | |
| Potassium Ion SCHEMBL25364189 | 0.82 | — | — | |
| Potassium Ion SCHEMBL135 | 0.82 | — | — | |
| Potassium Ion SCHEMBL11048785 | 0.67 | — | — | |
| Potassium Ion SCHEMBL23152429 | 0.67 | — | — | |
| Potassium Ion SCHEMBL21838753 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108559458-A | A kind of engine coolant | 南通市中京机械有限公司 | 2018-09-21 | — | — | CN | claimed |
| CN-119550700-A | Heat-insulating fireproof composite glass and preparation method and application thereof | 中国建筑材料科学研究总院有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-116917295-A | Metal complexes with 4-H, 6-H or 8-H-dihydroazulene ligands and uses thereof | 优米科尔股份公司及两合公司 | 2023-10-20 | — | — | CN | disclosed |
| CN-108559458-A | A kind of engine coolant | 南通市中京机械有限公司 | 2018-09-21 | — | — | CN | disclosed |
| CN-108559458-A | A kind of engine coolant | 南通市中京机械有限公司 | 2018-09-21 | — | — | CN | disclosed |
| CN-107106586-A | Skin barrier function improver and skin barrier function improvement composition | 昭和电工株式会社 | 2017-08-29 | — | — | CN | disclosed |
| CN-107106430-A | Mitochondrial function improver and aging prevent from using composition | 昭和电工株式会社 | 2017-08-29 | — | — | CN | disclosed |
| CN-107072916-A | Moisture-retaining agent | 昭和电工株式会社 | 2017-08-18 | — | — | CN | disclosed |
| US-7737043-B2 | Inspection method of compound semiconductor substrate, compound semiconductor substrate, surface treatment method of compound semiconductor substrate, and method of producing compound semiconductor crystal | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 2010-06-15 | — | — | US | disclosed |
| CN-100589236-C | Compound semiconductor substrate, inspection method thereof, surface treatment method thereof, and method of producing compound semiconductor crystal | SUMITOMO ELECTRIC INDUSTRIES | 2010-02-10 | — | — | CN | disclosed |
| US-20070269989-A1 | Inspection method of compound semiconductor substrate, compound semiconductor substrate, surface treatment method of compound semiconductor substrate, and method of producing compound semiconductor crystal | SUMITOMO ELECTRIC INDUSTRIES, LTD. | 2007-11-22 | — | — | US | disclosed |
| EP-1858062-A2 | Inspection method of compound semiconductor substrate, compound semiconductor substrate, surface treatment method of compound semiconductor substrate, and method of producing compound semiconductor crystal | Sumitomo Electric Industries, Ltd. (JP) | 2007-11-21 | — | — | EP | disclosed |
| CN-101075570-A | Inspection method of compound semiconductor substrate, compound semiconductor substrate, surface treatment method of compound semiconductor substrate, and method of producing compound semiconductor cr | SUMITOMO ELECTRIC INDUSTRIES (JP) | 2007-11-21 | — | — | CN | disclosed |
| US-20070264451-A1 | Method of manufacturing polymer member and polymer member | HITACHI MAXELL, LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20050057555-A1 | Information processing apparatus | HITACHI MAXELL, LTD. (JP) | 2005-03-17 | — | — | US | disclosed |