SCHEMBL3304672

SCHEMBL3304672

CCc1ccc(OC(C)OCCOc2c(-c3cccc(C)c3)cccc2-c2cccc(C)c2)cc1

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 3/20 0.38
FFAR4 Q5NUL3 1/20 0.38
PPARG P37231 4/20 0.36
PPARA Q07869 3/20 0.36
TDP1 Q9NUW8 2/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
REN P00797 5/20 0.33
ADRA2A P08913 1/20 0.32
ADRA2B P18089 1/20 0.32
ADRA2C P18825 1/20 0.32
PDE4A P27815 1/20 0.32
PDE4B Q07343 1/20 0.32
PDE4C Q08493 1/20 0.32
PDE4D Q08499 1/20 0.32
PPARD Q03181 1/20 0.32
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
ALDH1A1 P00352 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14113260 0.88 PPARA (0.39) PPARGPPARARENADRA2AADRA2B
SCHEMBL2758509 0.87 TDP1 (0.34) FFAR1FFAR4PPARGPPARATDP1
SCHEMBL16382401 0.81 AKR1C3 (0.36) ALDH1A1MAPT
SCHEMBL3326703 0.77 NPSR1 (0.46) FFAR1TDP1L3MBTL1NPC1RAB9A
SCHEMBL3303478 0.77 PPARA (0.37) PPARGPPARAADRA2AADRA2BADRA2C
SCHEMBL3323839 0.76 LTA4H (0.41) FFAR1FFAR4PPARGPPARAL3MBTL1
SCHEMBL3321951 0.76 ADRB2 (0.46) RAB9AALDH1A1
SCHEMBL3323842 0.75 CHRNB2 (0.44) PPARGPPARAL3MBTL1PPARDRAB9A
SCHEMBL14113254 0.75 PPARA (0.38) PPARGPPARAL3MBTL1RENPPARD
SCHEMBL13359779 0.75 REN (0.35) PPARGPPARARENADRA2AADRA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120003585-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed