Known targets — ChEMBL curated mechanism
BTKCACNA1CCACNA1DCACNA1FCACNA1SCACNA2D1CACNA2D2DRD2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQHRH1HTR2AP2RY12
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.63 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.63 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.63 |
| ▸ | TSHR | P16473 | 3/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.61 |
| ▸ | POLB | P06746 | 2/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.42 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.40 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | HTR6 | P50406 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | GFER | P55789 | 1/20 | 0.38 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL229800 | 0.90 | KDM4E (0.71) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| SCHEMBL594198 | 0.90 | ALDH1A1 (0.55) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| Sulfuric Acid SCHEMBL7637641 | 0.88 | KDM4E (0.68) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| SCHEMBL332135 | 0.88 | ALDH1A1 (0.68) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL28534741 | 0.88 | ALDH1A1 (0.58) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| Thiosulfuric Acid SCHEMBL8424194 | 0.86 | KDM4E (0.65) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| SCHEMBL330945 | 0.86 | KDM4E (0.65) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| Sulfuric Acid SCHEMBL229801 | 0.86 | KDM4E (0.65) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| Vinylsulfonic Acid SCHEMBL9519686 | 0.85 | ALDH1A1 (0.59) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 | |
| SCHEMBL17555952 | 0.84 | TDP1 (0.62) | ALDH1A1KDM4ETDP1TSHRSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112940432-B | Polymerizable monomer for dental material, composition, adhesive dental material, and kit | 三井化学株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-107427414-B | Polymerizable monomer for dental material, composition, adhesive dental material, and kit | 三井化学株式会社 | 2021-07-02 | — | — | CN | disclosed |
| CN-112940432-A | Polymerizable monomer for dental material, composition, adhesive dental material, and kit | 三井化学株式会社 | 2021-06-11 | — | — | CN | disclosed |
| CN-112513016-A | Sulfur-containing polymerizable monomer and use thereof | 尚美德齿科材料有限公司 | 2021-03-16 | — | — | CN | disclosed |
| EP-2295484-B1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS INC (JP) | 2018-01-17 | — | — | EP | disclosed |
| EP-2407498-B1 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | MITSUI CHEMICALS INC (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-8304507-B2 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | MITSUI CHEMICALS, INC. (JP) | 2012-11-06 | — | — | US | disclosed |
| EP-2407498-A2 | Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material | Mitsui Chemicals, Inc. (JP) | 2012-01-18 | — | — | EP | disclosed |
| US-20110112269-A1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM THE POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2011-05-12 | — | — | US | disclosed |
| EP-2295484-A1 | POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-6727294-B2 | RADIATION TRANSPARENT MOLDING MATERIALS | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20010034419-A1 | Radiation transparent molding materials | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2001-10-25 | — | — | US | disclosed |