Tetrabuthylammonium

Tetrabuthylammonium

SCHEMBL331982

CC(O)C(=O)O.CCCC[N+](CCCC)(CCCC)CCCC

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CHRM1DRD2DRD3DRD4HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR2APDE3ASIGMAR1

The experimentally established mechanism targets of Tetrabuthylammonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SLC22A1 O15245 3/20 0.55
TP53 P04637 2/20 0.50
GPR84 Q9NQS5 3/20 0.48
FFAR1 O14842 1/20 0.48
SLC22A2 O15244 1/20 0.48
ALDH1A1 P00352 1/20 0.44
CYP3A4 P08684 1/20 0.44
ALOX15 P16050 1/20 0.44
TSHR P16473 1/20 0.44
ALOX12 P18054 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
HIF1A Q16665 1/20 0.44
HSD17B10 Q99714 1/20 0.44
ACE2 Q9BYF1 1/20 0.44
FAAH O00519 1/20 0.42
MAPT P10636 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrabuthylammonium SCHEMBL26605872 0.98 SLC22A1 (0.52) SLC22A1TP53GPR84FFAR1SLC22A2
Tetrabuthylammonium SCHEMBL28396905 0.98 SLC22A1 (0.52) SLC22A1TP53GPR84FFAR1SLC22A2
Tetrabuthylammonium SCHEMBL27706863 0.98 SLC22A1 (0.52) SLC22A1TP53GPR84FFAR1SLC22A2
Lactic Acid SCHEMBL9630457 0.96 SLC22A1 (0.54) SLC22A1TP53GPR84FFAR1SLC22A2
Lactic Acid SCHEMBL8907767 0.88 TP53 (0.65) TP53GPR84FFAR1ALDH1A1TSHR
Tetrabuthylammonium SCHEMBL5874524 0.86 SLC22A1 (0.55) SLC22A1TP53GPR84FFAR1SLC22A2
Tetrabuthylammonium SCHEMBL107579 0.86 SLC22A1 (0.55) SLC22A1TP53GPR84FFAR1SLC22A2
Tetrapropylammonium SCHEMBL5574324 0.86 TP53 (0.55) SLC22A1TP53GPR84FFAR1TSHR
Dodecane SCHEMBL6896604 0.85 GPR84 (0.62) TP53GPR84FFAR1ALDH1A1ALOX15
Hexadecane SCHEMBL29288627 0.85 GPR84 (0.62) TP53GPR84FFAR1ALDH1A1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 856 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250314970-A1 OVERCOAT COMPOSITION AND PATTERNING METHODS TOKYO ELECTRON LTD (JP) 2025-10-09 US claimed
CN-118453443-A Use of vitamin C lactate and analogues thereof in preparation of skin tissue products and related products 长春圣博玛生物材料有限公司 2024-08-09 CN claimed
CN-115951561-B Chemical amplification type positive I-line photoresist and preparation and use methods thereof 徐州博康信息化学品有限公司 2024-01-26 CN claimed
CN-117234034-A Photoresist and preparation and use methods thereof 江西兆驰半导体有限公司 2023-12-15 CN claimed
CN-115951561-A Chemically amplified positive I-line photoresist and preparation and use methods thereof 徐州博康信息化学品有限公司 2023-04-11 CN claimed
US-6878504-B2 Chemically-amplified resist compositions EVERLIGHT USA, INC. (US) 2005-04-12 US claimed
US-20040241569-A1 Chemically-amplified resist compositions EVERLIGHT USA, INC. 2004-12-02 US claimed
US-6703178-B2 COMPRISES A POLYMER CONTAINING A NOVEL LACTONE ALICYCLIC UNIT; WELL-BALANCED OUTCOME OF ETCHING RESISTANCE AND SUBSTRATE ADHESION EVERLIGHT USA, INC. 2004-03-09 US claimed
CN-1462909-A Chemical amplification light resistance agent compsn. AMERICAN EVERBRIGHT CORP (US) 2003-12-24 CN claimed
US-20030232270-A1 CHEMICAL AMPLIFIED PHOTORESIST COMPOSITIONS EVERLIGHT USA, INC. (US) 2003-12-18 US claimed
US-12607933-B2 Polymer compositions having photoacid generators and photoresists DUPONT ELECTRONICS, INC. (US) 2026-04-21 US disclosed
US-12547072-B2 Self-aligned build-up processing GEMINATIO, INC. (US) 2026-02-10 US disclosed
US-12503551-B2 Fluorine-containing isocyanul compound DAIKIN INDUSTRIES, LTD. (JP) 2025-12-23 US disclosed
US-20250336673-A1 METHODS FOR SUBSTRATE PATTERNING PROCESS TOKYO ELECTRON LTD (JP) 2025-10-30 US disclosed
US-20250314970-A1 OVERCOAT COMPOSITION AND PATTERNING METHODS TOKYO ELECTRON LTD (JP) 2025-10-09 US disclosed
EP-0952489-A1 Positive photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-27 EP disclosed
EP-0930542-A1 Polymers and photoresist compositions for short wavelength imaging Shipley Company LLC (US) 1999-07-21 EP disclosed
US-5879856-A CONTROLLING PHOTOSPEED BY ADJUSTING AMOUNT OF LACTATE SALT PHOTOSPEED CONTROL AGENT IN PHOTORESIST COMPOSITION SHIPLEY COMPANY, L.L.C. (US) 1999-03-09 US disclosed
EP-0834770-A2 Dyed photoresists and methods and articles of manufacture comprising same Shipley Company LLC (US) 1998-04-08 EP disclosed
EP-0783136-A2 Chemically amplified positive photoresists Shipley Company LLC (US) 1997-07-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12547072-B2 Self-aligned build-up processing MYBBP1A, SMURF1, MYB SLC22A1 4459/4885TP53 2830/4885GPR84 3481/4885
US-12503551-B2 Fluorine-containing isocyanul compound AFF1, FLI1, RIF1 SLC22A1 1509/4885TP53 1852/4885GPR84 4551/4885
US-12607933-B2 Polymer compositions having photoacid generators and photoresists PFAS, AFF1, HBG1 SLC22A1 2619/4885TP53 2060/4885GPR84 2156/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.