SCHEMBL3322797

SCHEMBL3322797

C=C(C(=O)O)C(OC)(OC)C(CC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1068929 0.78
SCHEMBL11765862 0.68 PEPD (0.33)
SCHEMBL4964362 0.64 ALDH1A1 (0.38)
SCHEMBL5051057 0.63 TET2 (0.31)
SCHEMBL11582020 0.63 MMP12 (0.33)
Methacrylic Acid SCHEMBL28852331 0.61 ALDH1A1 (0.37)
SCHEMBL454677 0.61 SMN1; SMN2 (0.31)
SCHEMBL7203387 0.61 KIF11 (0.33)
SCHEMBL1696744 0.61 ALDH1A1 (0.30)
SCHEMBL8735204 0.60 MMP8 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8936898-B2 Photosensitive resin composition for imprinting process and method for forming organic layer over substrate LG DISPLAY CO., LTD. (KR) 2015-01-20 US disclosed
US-20100123269-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR IMPRINTING PROCESS AND METHOD FOR FORMING ORGANIC LAYER OVER SUBSTRATE LG DISPLAY CO., LTD. (KR) 2010-05-20 US disclosed