Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.32 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3341059 | 0.84 | CYP4F2 (0.33) | CYP4F2CYP4A11ALDH1A1TSHR | |
| SCHEMBL3339281 | 0.82 | MTNR1A (0.33) | ALDH1A1TSHR | |
| SCHEMBL1637617 | 0.80 | CYP4F2 (0.38) | CYP4F2CYP4A11 | |
| SCHEMBL9860003 | 0.78 | SLC6A4 (0.35) | ALDH1A1 | |
| SCHEMBL4849033 | 0.76 | ALDH1A1 (0.34) | ALDH1A1TSHR | |
| SCHEMBL2144177 | 0.76 | ALDH1A1 (0.34) | ALDH1A1TSHR | |
| SCHEMBL9860017 | 0.76 | — | — | |
| SCHEMBL929249 | 0.75 | CYP4F2 (0.32) | CYP4F2CYP4A11 | |
| SCHEMBL8347602 | 0.74 | TP53 (0.31) | — | |
| SCHEMBL11848934 | 0.74 | ALDH1A1 (0.33) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |