SCHEMBL3337272

SCHEMBL3337272

CCO[SiH](CC(C)c1ccccc1CCl)OCC

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11846937 0.85 SLC6A2 (0.31) TSHR
SCHEMBL2543708 0.84 TSHR (0.31) TSHR
SCHEMBL2100576 0.78 TSHR (0.33) TSHR
SCHEMBL6036856 0.74 TSHR (0.31) TSHR
SCHEMBL3337262 0.73 MAPT (0.30) TSHR
SCHEMBL3341517 0.73 ALDH1A1 (0.32) TSHR
SCHEMBL8767509 0.73 TAAR1 (0.45)
SCHEMBL9716072 0.72 TSHR (0.33) TSHR
SCHEMBL14841066 0.71 GABRA1 (0.36) TSHR
SCHEMBL929248 0.71 ESR1 (0.33) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed