Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.43 |
| ▸ | TYR | P14679 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.43 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | MIF | P14174 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.43 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | CA12 | O43570 | 6/20 | 0.38 |
| ▸ | CA2 | P00918 | 6/20 | 0.38 |
| ▸ | CA9 | Q16790 | 6/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 6/20 | 0.38 |
| ▸ | CA1 | P00915 | 5/20 | 0.38 |
| ▸ | CA7 | P43166 | 4/20 | 0.38 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.38 |
| ▸ | MAOB | P27338 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30678706 | 1.00 | ALDH1A1 (0.43) | ALDH1A1HSD17B10TYRLMNAALOX15 | |
| SCHEMBL563090 | 0.80 | TYR (0.41) | ALDH1A1HSD17B10TYRLMNAALOX15 | |
| SCHEMBL12786119 | 0.76 | HSD17B10 (0.50) | ALDH1A1HSD17B10LMNAALOX15NR1I2 | |
| SCHEMBL9296266 | 0.76 | TRPA1 (0.52) | ALDH1A1HSD17B10LMNAALOX15HTT | |
| SCHEMBL8977691 | 0.74 | TYR (0.35) | ALDH1A1HSD17B10TYRLMNAALOX15 | |
| Hydrochloric Acid SCHEMBL11157061 | 0.73 | ALDH1A1 (0.46) | ALDH1A1HSD17B10TYRLMNAALOX15 | |
| SCHEMBL9297808 | 0.73 | ALDH1A1 (0.59) | ALDH1A1HSD17B10TYRLMNAALOX15 | |
| SCHEMBL9539791 | 0.72 | TYR (0.42) | ALDH1A1HSD17B10TYRLMNAALOX15 | |
| SCHEMBL9297619 | 0.72 | ALOX5 (0.57) | ALDH1A1HSD17B10LMNAALOX15CYP2C9 | |
| SCHEMBL6938683 | 0.71 | ALOX15 (0.41) | ALDH1A1HSD17B10TYRLMNAALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240213072-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240199924-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-4310157-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING MACHINED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2024-01-24 | — | — | EP | disclosed |
| EP-4309893-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2024-01-24 | — | — | EP | disclosed |
| CN-117157738-A | Laminate, stripper composition, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2023-12-01 | — | — | CN | disclosed |
| CN-117157739-A | Laminate, stripper composition, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2023-12-01 | — | — | CN | disclosed |
| WO-2022210262-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | 日産化学株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-10607876-B2 | Method for processing mold material and method for manufacturing structural body | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-03-31 | — | — | US | disclosed |
| US-10112377-B2 | Supporting member separation method and supporting member separation apparatus | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-10-30 | — | — | US | disclosed |
| EP-2133366-B1 | FINE FIBROUS CELLULOSE MATERIAL AND METHOD FOR PRODUCING THE SAME | AIST (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-20010044080-A1 | Method for forming a finely patterned photoresist layer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-22 | — | — | US | disclosed |
| US-6284428-B1 | FOR FORMING OF ANTIREFLECTION UNDERCOATING LAYER TO INTERVENE BETWEEN SURFACE OF SUBSTRATE AND PHOTORESIST LAYER TO BE PATTERNED IN MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICES | TOKYO OHKA KOGYO CO., LTD, (JP) | 2001-09-04 | — | — | US | disclosed |
| US-20010018163-A1 | Undercoating composition for photolithographic resist | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6083665-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-04 | — | — | US | disclosed |
| US-6071673-A | Method for the formation of resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-06 | — | — | US | disclosed |
| US-5948847-A | ACRYLATED ESTER CROSSLINKED WITH NITROGEN CONTAINING ORGANIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-07 | — | — | US | disclosed |
| US-5925495-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5908738-A | Undercoating composition for photolithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-06-01 | — | — | US | disclosed |
| US-5756255-A | Undercoating composition for photolithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-05-26 | — | — | US | disclosed |