SCHEMBL563090

SCHEMBL563090

[O-][S+](c1ccc(O)cc1O)c1ccc(O)cc1O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYR P14679 6/20 0.41
CES2 O00748 1/20 0.39
ALDH1A1 P00352 4/20 0.38
HSD17B10 Q99714 4/20 0.38
CA12 O43570 4/20 0.38
CA2 P00918 4/20 0.38
CA9 Q16790 4/20 0.38
CA14 Q9ULX7 4/20 0.38
ALOX5 P09917 3/20 0.38
LMNA P02545 3/20 0.38
CA1 P00915 3/20 0.38
ALOX15 P16050 2/20 0.38
CA7 P43166 2/20 0.38
NR1I2 O75469 1/20 0.38
CYP2C9 P11712 1/20 0.38
MIF P14174 1/20 0.38
HTT P42858 1/20 0.38
NFE2L2 Q16236 1/20 0.38
TSHR P16473 1/20 0.38
PTGS1 P23219 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8977691 0.88 TYR (0.35) TYRCES2ALDH1A1HSD17B10CA12
SCHEMBL9539791 0.87 TYR (0.42) TYRCES2ALDH1A1HSD17B10CA12
SCHEMBL11765918 0.85 ALOX5 (0.45) TYRALDH1A1HSD17B10CA12CA2
SCHEMBL23484292 0.81 TYR (0.40) TYRCES2ALDH1A1HSD17B10CA12
SCHEMBL30678706 0.80 ALDH1A1 (0.43) TYRCES2ALDH1A1HSD17B10CA12
SCHEMBL3337792 0.80 ALDH1A1 (0.43) TYRCES2ALDH1A1HSD17B10CA12
SCHEMBL10539910 0.79 HSD17B10 (0.44) ALDH1A1HSD17B10CA12CA2CA9
SCHEMBL10539835 0.76 HSD17B10 (0.50) ALDH1A1HSD17B10CA2ALOX5LMNA
SCHEMBL8388713 0.76 ESR1 (0.41) TYRMIF
SCHEMBL6938683 0.76 ALOX15 (0.41) TYRALDH1A1HSD17B10LMNAALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 347 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8859819-B2 Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof PIERRE FABRE DERMO-COSMETIQUE (FR) 2014-10-14 US claimed
EP-2417104-A1 SULPHURATED DERIVATIVES OF RESORCINOL, PREPARATION OF SAME AND COSMETIC USES THEREOF Pierre Fabre Dermo-Cosmétique (FR) 2012-02-15 EP claimed
US-20120034176-A1 SULPHURATED DERIVATIVES OF RESORCINOL, PREPARATION OF SAME AND COSMETIC USES THEREOF PIERRE FABRE DERMO-COSMETIQUE (FR) 2012-02-09 US claimed
WO-2010115945-A1 SULPHURATED DERIVATIVES OF RESORCINOL, PREPARATION OF SAME AND COSMETIC USES THEREOF PIERRE FABRE DERMO-COSMETIQUE (FR) 2010-10-14 WO claimed
EP-2203783-A2 THICK FILM RESISTS AZ Electronic Materials USA Corp. (US) 2010-07-07 EP claimed
WO-2009040661-A2 THICK FILM RESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-04-02 WO claimed
US-20090081589-A1 THICK FILM RESISTS MERCK PATENT GMBH (DE) 2009-03-26 US claimed
US-5908738-A Undercoating composition for photolithography TOKYO OHKA KOGYO CO., LTD. (JP) 1999-06-01 US claimed
US-5756255-A Undercoating composition for photolithography TOKYO OHKA KOGYO CO., LTD. (JP) 1998-05-26 US claimed
US-4304831-A ELECTROGRAPHY; COPIES RICOH CO., LTD. (JP) 1981-12-08 US claimed
JP-5169835-A None JP disclosed
WO-2024150700-A1 RESIN COMPOSITION, CURED ARTICLE, MULTILAYER BODY, METHOD FOR PRODUCING CURED ARTICLE, METHOD FOR PRODUCING MULTILAYER BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN 富士フイルム株式会社 2024-07-18 WO disclosed
WO-2024143210-A1 MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143211-A1 MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143212-A1 METHOD FOR MANUFACTURING LAMINATE, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR MEMBER, AND RESIN COMPOSITION 富士フイルム株式会社 2024-07-04 WO disclosed
US-4400456-A FATTY ACID AMIDE COLOR ASSIST, HIGH DENSITY IMAGES RICOH CO., LTD. (JP) 1983-08-23 US disclosed
US-4304831-A ELECTROGRAPHY; COPIES RICOH CO., LTD. (JP) 1981-12-08 US disclosed
US-4207110-A 2,5-DIALKOXY-4-MORPHOLINO-BENZENE DIAZONIUM SALT AND COUPLER COMBINATION TO GIVE BLACK IMAGE HOECHST AKTIENGESELLSCHAFT (DE) 1980-06-10 US disclosed
EP-0001617-A1 Diazotype material HOECHST AKTIENGESELLSCHAFT (DE) 1979-05-02 EP disclosed
US-4025399-A ELECTRICAL, RECORDING LAYER WITH A CONDUCTIVE AGENT, A LEUCO BASE AND A PHENOLIC RESIN CANON KABUSHIKI KAISHA (JA) 1977-05-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120034176-A1 SULPHURATED DERIVATIVES OF RESORCINOL, PREPARATION OF SAME AND COSMETIC USES THEREOF CBR3, ACSL3, MSRB3 TYR 5/4885CES2 113/4885ALDH1A1 1032/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.