⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL443028 | 0.74 | ALDH1A1 (0.30) | — | |
| SCHEMBL12479409 | 0.72 | — | — | |
| SCHEMBL19970538 | 0.69 | ALDH1A1 (0.31) | — | |
| SCHEMBL2154040 | 0.69 | — | — | |
| SCHEMBL16197081 | 0.69 | TSHR (0.33) | — | |
| SCHEMBL28608405 | 0.69 | CA2 (0.31) | — | |
| SCHEMBL2566448 | 0.68 | ALOX15 (0.33) | — | |
| SCHEMBL28587549 | 0.68 | ALDH1A1 (0.31) | — | |
| SCHEMBL555039 | 0.67 | — | — | |
| SCHEMBL502432 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107207877-B | Coated pigments, method for the production and use thereof, coating agents and articles | 埃卡特有限公司 | 2020-09-29 | — | — | CN | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |