SCHEMBL7966951

SCHEMBL7966951

CCCOc1c2ccccc2cc2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TLR8 Q9NR97 1/20 0.44
BTK Q06187 1/20 0.43
CNR1 P21554 1/20 0.42
CNR2 P34972 1/20 0.42
GPR84 Q9NQS5 1/20 0.42
HTR2A P28223 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
GABRP O00591 1/20 0.41
GABRD O14764 1/20 0.41
GABRA1 P14867 1/20 0.41
GABRB1 P18505 1/20 0.41
GABRG2 P18507 1/20 0.41
GABRB3 P28472 1/20 0.41
GABRA5 P31644 1/20 0.41
GABRA3 P34903 1/20 0.41
GABRA2 P47869 1/20 0.41
GABRB2 P47870 1/20 0.41
GABRA4 P48169 1/20 0.41
GABRE P78334 1/20 0.41
GABRA6 Q16445 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29371827 1.00 TLR8 (0.44) TLR8BTKCNR1CNR2GPR84
SCHEMBL293401 0.90 SLC2A1 (0.48) TLR8CNR1CNR2L3MBTL1GABRP
SCHEMBL29368652 0.90 SLC2A1 (0.48) TLR8CNR1CNR2L3MBTL1GABRP
SCHEMBL23089937 0.89 TLR8 (0.46) TLR8CNR1CNR2L3MBTL1HTR1B
SCHEMBL29368699 0.89 TLR8 (0.46) TLR8CNR1CNR2L3MBTL1HTR1B
SCHEMBL29368618 0.88 CYP2A6 (0.40) TLR8BTKCNR1CNR2GPR84
SCHEMBL23089920 0.88 CYP2A6 (0.40) TLR8BTKCNR1CNR2GPR84
SCHEMBL7877916 0.87 GPR84 (0.47) GPR84HTR2AL3MBTL1HTR1BCYP1A2
SCHEMBL23089973 0.87 CYP1A2 (0.47) TLR8BTKCNR1CNR2GPR84
SCHEMBL23089972 0.87 L3MBTL1 (0.41) TLR8BTKCNR1CNR2L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
US-11613509-B2 Radical polymerization control agent and radical polymerization control method KAWASAKI KASEI CHEMICALS LTD. (JP) 2023-03-28 US disclosed
CN-110891980-B Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2022-09-30 CN disclosed
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US disclosed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed
CN-113166043-A Electrolyte for sulfur-based magnesium battery 富士胶片和光纯药株式会社 2021-07-23 CN disclosed
CN-112912407-A Curable resin composition, cured product, and organic EL display element 积水化学工业株式会社 2021-06-04 CN disclosed
US-20210122692-A1 RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-04-29 US disclosed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US disclosed
CN-103627316-A Antireflective coatings for via fill and photolithography applications and methods of preparation thereof HONEYWELL INT INC 2014-03-12 CN disclosed
CN-1902546-B Antireflective coatings for via filling and photolithography and methods of making the same HONEYWELL INT INC 2012-11-14 CN disclosed
CN-1606713-B Spincoating antireflection paint for photolithography HONEYWELL INT INC 2011-07-06 CN disclosed
US-7901867-B2 Sulphonium salt initiators BASF SE (DE) 2011-03-08 US disclosed
US-20090208872-A1 Sulphonium Salt Initiators BASF SE (DE) 2009-08-20 US disclosed
CN-1902546-A Antireflective coatings for via filling and photolithography and methods of making the same HONEYWELL INT INC (US) 2007-01-24 CN disclosed
CN-1615333-A Spin-on-glass antireflective coatings for photolithography HONEYWELL INT INC (US) 2005-05-11 CN disclosed
CN-1615332-A Antireflective coatings for photolithography and methods of making the same HONEYWELL INT INC (US) 2005-05-11 CN disclosed
CN-1606713-A Spincoating antireflection paint for photolithography HONEYWELL INT INC (US) 2005-04-13 CN disclosed
US-6242459-B1 Substituted bis-acridines and related compounds as CCR5 receptor ligands, anti-inflammatory agents and anti-viral agents SMITHKLINE BEECHAM CORPORATION 2001-06-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11613509-B2 Radical polymerization control agent and radical polymerization control method PPOX, NOX4, CROCC TLR8 4378/4885BTK 960/4885CNR1 2468/4885
US-20210122692-A1 RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD PPOX, NOX4, CROCC TLR8 4378/4885BTK 960/4885CNR1 2468/4885
US-20090208872-A1 Sulphonium Salt Initiators OR10J3, OXSR1, ARSA TLR8 2634/4885BTK 3378/4885CNR1 647/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.