Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.51 |
| ▸ | MAPK1 | P28482 | 6/20 | 0.51 |
| ▸ | MEN1 | O00255 | 5/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.51 |
| ▸ | MAPT | P10636 | 5/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.51 |
| ▸ | POLB | P06746 | 3/20 | 0.51 |
| ▸ | RECQL | P46063 | 3/20 | 0.51 |
| ▸ | USP2 | O75604 | 2/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.51 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | BLM | P54132 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 3/20 | 0.45 |
| ▸ | RAB9A | P51151 | 3/20 | 0.45 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.45 |
| ▸ | TRPM5 | Q9NZQ8 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12106085 | 0.90 | MEN1 (0.52) | ALDH1A1MAPK1MEN1KMT2AMAPT | |
| SCHEMBL340532 | 0.88 | MEN1 (0.42) | ALDH1A1MAPK1MEN1KMT2AMAPT | |
| SCHEMBL3343576 | 0.86 | L3MBTL1 (0.42) | ALDH1A1MAPK1MEN1KMT2AMAPT | |
| SCHEMBL3349361 | 0.83 | KEAP1 (0.51) | ALDH1A1MAPK1MEN1KMT2AMAPT | |
| SCHEMBL8483627 | 0.83 | ESRRG (0.48) | ALDH1A1MAPK1MEN1KMT2AMAPT | |
| SCHEMBL3341126 | 0.83 | EGFR (0.42) | ALDH1A1MAPK1MEN1KMT2AMAPT | |
| SCHEMBL1132513 | 0.82 | ALDH1A1 (0.53) | ALDH1A1MEN1KMT2AMAPTRECQL | |
| SCHEMBL9463877 | 0.81 | MAPT (0.51) | ALDH1A1MAPK1MEN1KMT2AMAPT | |
| SCHEMBL12103720 | 0.81 | MEN1 (0.45) | ALDH1A1MAPK1MEN1KMT2AMAPT | |
| SCHEMBL1633085 | 0.81 | CNR2 (0.51) | ALDH1A1MEN1KMT2AMAPTNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | claimed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119264419-A | Clustering peptide with side group containing functionalized diphenylamine group and preparation method thereof | 华东理工大学 | 2025-01-07 | — | — | CN | disclosed |
| CN-118159908-A | Photosensitive element and method for forming resist pattern | 旭化成株式会社 | 2024-06-07 | — | — | CN | disclosed |
| WO-2024085254-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-04-25 | — | — | WO | disclosed |
| WO-2023074325-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2023-05-04 | — | — | WO | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-5847071-A | Photosensitive resin composition | HITACHI, CHEMICAL CO., LTD. (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5668248-A | POLYAMIC ACID ESTERS | HITACHI CHEMICAL CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| US-5472823-A | Polyamic acids | HITACHI CHEMICAL CO., LTD. (JP) | 1995-12-05 | — | — | US | disclosed |
| EP-0373952-B1 | Photosensitive resin composition and photosensitive element using the same | HITACHI CHEMICAL CO LTD (JP) | 1995-02-08 | — | — | EP | disclosed |
| US-5262277-A | Light sensitive elements for electrical thick films with heat resistance | HITACHI CHEMICAL COMPANY, INC. (JP) | 1993-11-16 | — | — | US | disclosed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0373952-A2 | Photosensitive resin composition and photosensitive element using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-06-20 | — | — | EP | disclosed |