Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR2 | P34972 | 10/20 | 0.51 |
| ▸ | MAPT | P10636 | 4/20 | 0.49 |
| ▸ | CNR1 | P21554 | 5/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 2/20 | 0.48 |
| ▸ | HTT | P42858 | 2/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | GHSR | Q92847 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12106085 | 0.90 | MEN1 (0.52) | CNR2MAPTMEN1KMT2AGAA | |
| SCHEMBL342249 | 0.88 | ALDH1A1 (0.44) | CNR2MAPTMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL3349327 | 0.86 | CNR2 (0.43) | CNR2MAPTCNR1MEN1KMT2A | |
| SCHEMBL3349361 | 0.83 | KEAP1 (0.51) | CNR2MAPTCNR1MEN1KMT2A | |
| SCHEMBL8483627 | 0.83 | ESRRG (0.48) | MAPTMEN1KMT2AGAAHTT | |
| SCHEMBL3347146 | 0.83 | CNR2 (0.47) | CNR2MAPTCNR1MEN1KMT2A | |
| SCHEMBL1132513 | 0.82 | ALDH1A1 (0.53) | CNR2MAPTMEN1KMT2AGAA | |
| SCHEMBL29004880 | 0.82 | CNR2 (0.50) | CNR2CNR1MEN1KMT2ANPC1 | |
| SCHEMBL4127840 | 0.81 | ALDH1A1 (0.47) | CNR2MAPTMEN1KMT2AGAA | |
| SCHEMBL12103720 | 0.81 | MEN1 (0.45) | CNR2MAPTMEN1KMT2AGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7153631-B2 | Pattern-forming process using photosensitive resin composition | HITACHI CHEMICAL CO., LTD. (JP) | 2006-12-26 | — | — | US | claimed |
| EP-0551697-B1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO LTD (JP) | 1997-05-14 | — | — | EP | claimed |
| EP-0551697-A1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO., LTD. (JP) | 1993-07-21 | — | — | EP | claimed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | claimed |
| US-5034429-A | An unsaturated monomer, a photoinitiator and a benzene derivative for providing a cured film | HITACHI CHEMICAL CO., LTD. (JP) | 1991-07-23 | — | — | US | claimed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119684161-A | Compound containing ureido structure, negative photosensitive resin composition, and preparation method and application thereof | 波米科技有限公司 | 2025-03-25 | — | — | CN | disclosed |
| CN-119596638-A | Negative photosensitive resin composition, preparation method and application | 波米科技有限公司 | 2025-03-11 | — | — | CN | disclosed |
| CN-118567183-B | Photosensitive resin composition containing polyamide acid microspheres, photosensitive resin sheet and application thereof | 波米科技有限公司 | 2025-02-11 | — | — | CN | disclosed |
| CN-118812451-A | Triazinetrione compound containing carbon-carbon double bond and application thereof | 波米科技有限公司 | 2024-10-22 | — | — | CN | disclosed |
| CN-118567183-A | Photosensitive resin composition containing polyamide acid microspheres, photosensitive resin sheet and application thereof | 波米科技有限公司 | 2024-08-30 | — | — | CN | disclosed |
| CN-117756974-B | Photoinitiator with high molecular polymer structure, photosensitive resin composition and application thereof | 波米科技有限公司 | 2024-08-27 | — | — | CN | disclosed |
| US-5262277-A | Light sensitive elements for electrical thick films with heat resistance | HITACHI CHEMICAL COMPANY, INC. (JP) | 1993-11-16 | — | — | US | disclosed |
| EP-0551697-A1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO., LTD. (JP) | 1993-07-21 | — | — | EP | disclosed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0373952-A2 | Photosensitive resin composition and photosensitive element using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-06-20 | — | — | EP | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |
| EP-0294220-A2 | Photopolymerizable composition | Hitachi Chemical Co., Ltd. (JP) | 1988-12-07 | — | — | EP | disclosed |