SCHEMBL3348811

SCHEMBL3348811

CCCN(CC(=O)O)c1ccc(C)cc1

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 1/20 0.49
NFE2L2 Q16236 1/20 0.49
SMN1; SMN2 Q16637 1/20 0.42
CYP2C19 P33261 1/20 0.42
EGFR P00533 1/20 0.41
ERBB2 P04626 1/20 0.41
CNR2 P34972 2/20 0.40
PPARG P37231 1/20 0.40
MAPT P10636 1/20 0.39
TSHR P16473 1/20 0.39
MAPK1 P28482 1/20 0.39
HTT P42858 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
PLA2G2A P14555 1/20 0.39
BLM P54132 1/20 0.39
TP53 P04637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3347562 0.90 KEAP1 (0.46) KEAP1NFE2L2SMN1; SMN2CYP2C19EGFR
SCHEMBL9974573 0.87 KEAP1 (0.56) KEAP1NFE2L2SMN1; SMN2CYP2C19CNR2
SCHEMBL430658 0.85 TP53 (0.49) SMN1; SMN2CYP2C19CNR2TSHRNPSR1
SCHEMBL3349361 0.85 KEAP1 (0.51) KEAP1NFE2L2SMN1; SMN2CYP2C19CNR2
SCHEMBL8517506 0.85 RAB9A (0.47) SMN1; SMN2CNR2MAPTTSHRMAPK1
SCHEMBL3343576 0.84 L3MBTL1 (0.42) KEAP1NFE2L2SMN1; SMN2EGFRERBB2
SCHEMBL14557227 0.84 CNR2 (0.46) KEAP1NFE2L2SMN1; SMN2CYP2C19EGFR
SCHEMBL3349327 0.84 CNR2 (0.43) SMN1; SMN2EGFRERBB2CNR2MAPT
SCHEMBL7402095 0.83 ALDH1A1 (0.46) SMN1; SMN2CNR2MAPTTSHRHTT
SCHEMBL14432320 0.81 EGFR (0.41) KEAP1NFE2L2SMN1; SMN2EGFRERBB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US claimed
CN-118159908-A Photosensitive element and method for forming resist pattern 旭化成株式会社 2024-06-07 CN disclosed
WO-2023074325-A1 PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2023-05-04 WO disclosed
US-20100159691-A1 PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE ASAHI KASEI EMD CORPORATION (JP) 2010-06-24 US disclosed
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US disclosed
EP-0295044-B1 PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME Hitachi Chemical Co., Ltd. (JP) 1992-04-22 EP disclosed
US-4987057-A HIGH SENSITIVITY TO VISIBLE LIGHT RAYS HITACHI CHEMICAL CO., LTD. (JP) 1991-01-22 US disclosed