Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.32 |
| ▸ | OPRM1 | P35372 | 2/20 | 0.32 |
| ▸ | OPRD1 | P41143 | 2/20 | 0.32 |
| ▸ | OPRK1 | P41145 | 2/20 | 0.32 |
| ▸ | OPRL1 | P41146 | 2/20 | 0.32 |
| ▸ | EDNRB | P24530 | 1/20 | 0.30 |
| ▸ | EDNRA | P25101 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrylammonium SCHEMBL3361654 | 0.94 | SLC7A5 (0.33) | SLC7A5OPRM1OPRD1OPRK1OPRL1 | |
| Tetrabuthylammonium SCHEMBL809815 | 0.93 | SLC7A5 (0.30) | SLC7A5OPRM1OPRD1OPRK1OPRL1 | |
| Tetramethylammonium Ion SCHEMBL3360726 | 0.89 | IDO1 (0.32) | EDNRBEDNRA | |
| SCHEMBL4606555 | 0.88 | SLC7A5 (0.34) | SLC7A5OPRM1OPRD1OPRK1OPRL1 | |
| Tetrabuthylammonium SCHEMBL18094601 | 0.86 | — | — | |
| SCHEMBL7659869 | 0.85 | SLC7A5 (0.36) | SLC7A5OPRM1OPRD1OPRK1OPRL1 | |
| Tetrabuthylammonium SCHEMBL20508670 | 0.84 | EDNRB (0.31) | SLC7A5OPRM1OPRD1OPRK1OPRL1 | |
| Tetrylammonium SCHEMBL3361103 | 0.83 | EDNRB (0.31) | SLC7A5EDNRBEDNRA | |
| Tetramethylammonium Ion SCHEMBL3361129 | 0.81 | FAAH (0.32) | — | |
| Tetramethylammonium Ion SCHEMBL1263432 | 0.76 | NPC1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2172806-A2 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board | Hitachi Chemical Company, Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-7232647-B2 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7220533-B2 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2007-05-22 | — | — | US | disclosed |
| US-20050164124-A1 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2005-07-28 | — | — | US | disclosed |
| US-20040038149-A1 | Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2004-02-26 | — | — | US | disclosed |
| EP-1282010-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2003-02-05 | — | — | EP | disclosed |
| US-6489374-B1 | ORGANONITROGEN COMPOUNDS THAT YIELD AMINES, IMINES OR AMIDINES WHEN EXPOSED TO VISIBLE OR ULTRAVIOLET RADIATION; POLYMERIZATION CATALYSTS USED IN ONE-POT SYSTEMS HAVING STORAGE STABILITY | CIBA SPECIALTY CHEMICALS CORPORATION | 2002-12-03 | — | — | US | disclosed |