Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL3365764

CCCCOC(=O)OC1CC[S+](c2cccc3ccccc23)C1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.32

Full drug profile on Sugi Atlas →

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 1/20 0.32
CNR2 P34972 1/20 0.32
KCNH2 Q12809 6/20 0.32
MAPT P10636 1/20 0.32
ALDH1A1 P00352 3/20 0.31
HPGD P15428 1/20 0.31
ELANE P08246 1/20 0.31
KDM4E B2RXH2 2/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 2/20 0.30
L3MBTL1 Q9Y468 2/20 0.30
GAA P10253 1/20 0.30
SLC2A1 P11166 1/20 0.30
TSHR P16473 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL3367466 0.95 ALDH1A1 (0.32) CNR1CNR2ALDH1A1HPGD
SCHEMBL3368083 0.92
Trifluoromethanesulfonic Acid SCHEMBL2745117 0.91 ALDH1A1 (0.38) MAPTALDH1A1HPGDKDM4EHSD17B10
SCHEMBL3367546 0.89 CNR1 (0.33) CNR1CNR2MAPTALDH1A1HPGD
Trifluoromethanesulfonic Acid SCHEMBL3364319 0.87 KCNH2 (0.35) CNR1CNR2KCNH2MAPTTDP1
SCHEMBL3367266 0.86
Trifluoromethanesulfonic Acid SCHEMBL6838193 0.86 HCRTR1 (0.33) ALDH1A1HPGDHSD17B10
Trifluoromethanesulfonic Acid SCHEMBL6564000 0.85 POLB (0.34) KCNH2ALDH1A1HPGDELANEKDM4E
SCHEMBL3362985 0.85 CNR1 (0.33) CNR1CNR2ALDH1A1HPGDKDM4E
Trifluoromethanesulfonic Acid SCHEMBL2745482 0.84 MEN1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-6403280-B1 TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY JSR CORPORATION (JP) 2002-06-11 US disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
EP-1048983-A1 Radiation sensitive resin composition JSR Corporation (JP) 2000-11-02 EP disclosed