Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | ACACB | O00763 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3366586 | 0.91 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6838193 | 0.90 | HCRTR1 (0.33) | MEN1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL3365831 | 0.88 | KCNJ11 (0.33) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2745117 | 0.88 | ALDH1A1 (0.38) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL3367466 | 0.86 | ALDH1A1 (0.32) | — | |
| SCHEMBL3367541 | 0.85 | KDM4E (0.32) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL3365764 | 0.84 | CNR1 (0.32) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6562721 | 0.84 | STS (0.30) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6845188 | 0.84 | ACHE (0.32) | — | |
| SCHEMBL3363116 | 0.81 | RORC (0.32) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8178159-B2 | Organosilicate resin formulation for use in microelectronic devices | DOW GLOBAL TECHNOLOGIES LLC | 2012-05-15 | — | — | US | disclosed |
| US-20070185298-A1 | Organosilicate resin formulation for use in microelectronic devices | DOW GLOBAL TECHNOLOGIES LLC | 2007-08-09 | — | — | US | disclosed |
| EP-1614151-A2 | ORGANOSILICATE RESIN FORMULATION FOR USE IN MICROELECTRONIC DEVICES | DOW GLOBAL TECHNOLOGIES INC. (US) | 2006-01-11 | — | — | EP | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| WO-2004090965-A2 | ORGANOSILICATE RESIN FORMULATION FOR USE IN MICROELECTRONIC DEVICES | DOW GLOBAL TECHNOLOGIES INC. (US) | 2004-10-21 | — | — | WO | disclosed |
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |