SCHEMBL3397697

SCHEMBL3397697

C(=Cc1cccnc1C=Cc1ccccc1)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FGF23 Q9GZV9 1/20 0.51
KDM4E B2RXH2 3/20 0.50
NFE2L2 Q16236 3/20 0.48
TRPA1 O75762 2/20 0.48
CYP11B1 P15538 1/20 0.48
CYP11B2 P19099 1/20 0.48
MEN1 O00255 4/20 0.47
KMT2A Q03164 4/20 0.47
ALDH1A1 P00352 1/20 0.47
HPGD P15428 1/20 0.47
NPC1 O15118 2/20 0.45
RAB9A P51151 2/20 0.45
GLA P06280 1/20 0.45
MAPT P10636 1/20 0.45
MAPK1 P28482 1/20 0.45
ATM Q13315 1/20 0.45
NPSR1 Q6W5P4 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
ALK Q9UM73 1/20 0.41
GRM4 Q14833 5/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3397695 1.00 FGF23 (0.51) FGF23KDM4ENFE2L2TRPA1CYP11B1
SCHEMBL8450489 0.87 FGF23 (0.48) FGF23KDM4ENFE2L2TRPA1CYP11B1
SCHEMBL618741 0.87 FGF23 (0.48) FGF23KDM4ENFE2L2TRPA1CYP11B1
SCHEMBL18919836 0.87 KDM4E (0.46) FGF23KDM4ENFE2L2TRPA1CYP11B1
SCHEMBL782094 0.86 FGF23 (0.44) FGF23KDM4ENFE2L2TRPA1CYP11B1
SCHEMBL6718565 0.86 KDM4E (0.43) FGF23KDM4ENFE2L2TRPA1CYP11B1
Butadiene SCHEMBL7606744 0.84 FGF23 (0.46) FGF23KDM4ENFE2L2TRPA1CYP11B1
SCHEMBL9166069 0.82 KDM4E (0.51) KDM4ENFE2L2TRPA1CYP11B1CYP11B2
SCHEMBL57903 0.81 MEN1 (0.56) KDM4ENFE2L2CYP11B1CYP11B2MEN1
SCHEMBL57902 0.81 MEN1 (0.56) KDM4ENFE2L2CYP11B1CYP11B2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170329220-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE HITACHI CHEMICAL COMPANY, LTD. (JP) 2017-11-16 US claimed
US-20100190803-A1 BIS(STYRYL)PYRIMIDINE OR BIS(STYRYL)BENZENE COMPOUNDS, PHARMACEUTICALLY ACCEPTABLE SALTS THEREOF, PREPARATION METHOD THEREOF, AND PHARMACEUTICAL COMPOSITION FOR PREVENTION OR TREATMENT OF DISEASES FEATURING AMYLOIDS COMPRISING THE SAME AS AN ACTIVE INGREDIENT KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2010-07-29 US claimed
EP-3957692-B1 PRIMER COMPOSITION MARABU GMBH & CO KG (DE) 2024-05-15 EP disclosed
EP-3957692-A1 PRIMER COMPOSITION Marabu GmbH & Co. KG (DE) 2022-02-23 EP disclosed
US-20170329220-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE HITACHI CHEMICAL COMPANY, LTD. (JP) 2017-11-16 US disclosed
US-20170329220-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE HITACHI CHEMICAL COMPANY, LTD. (JP) 2017-11-16 US disclosed
CN-106716250-A Photosensitive resin composition, photosensitive element, cured product, semiconductor device, method for forming resist pattern, and method for producing circuit substrate 日立化成株式会社 2017-05-24 CN disclosed
WO-2016084855-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE 日立化成株式会社 2016-06-02 WO disclosed
US-8410116-B2 Bis(styryl)pyrimidine or bis(styryl)benzene compounds, pharmaceutically acceptable salts thereof, preparation method thereof, and pharmaceutical composition for prevention or treatment of diseases featuring amyloids comprising the same as an active ingredient KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2013-04-02 US disclosed
US-7839078-B2 Organic electroluminescent element having a luminescent layer and a buffer layer adjacent thereto FUJIFILM CORPORATION (JP) 2010-11-23 US disclosed
US-20100190803-A1 BIS(STYRYL)PYRIMIDINE OR BIS(STYRYL)BENZENE COMPOUNDS, PHARMACEUTICALLY ACCEPTABLE SALTS THEREOF, PREPARATION METHOD THEREOF, AND PHARMACEUTICAL COMPOSITION FOR PREVENTION OR TREATMENT OF DISEASES FEATURING AMYLOIDS COMPRISING THE SAME AS AN ACTIVE INGREDIENT KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2010-07-29 US disclosed
US-20070057630-A1 Organic electroluminescent element FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed
US-4680407-A Certain alkali metal bis-phenethyl or tris-phenethyl-pyridines useful as multifunctional anionic initiators ENICHEM ELASTOMERI S.P.A. (IT) 1987-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100190803-A1 BIS(STYRYL)PYRIMIDINE OR BIS(STYRYL)BENZENE COMPOUNDS, PHARMACEUTICALLY ACCEPTABLE SALTS THEREOF, PREPARATION METHOD THEREOF, AND PHARMACEUTICAL COMPOSITION FOR PREVENTION OR TREATMENT OF DISEASES FEATURING AMYLOIDS COMPRISING THE SAME AS AN ACTIVE INGREDIENT PSEN1, APP, BACE1 FGF23 3675/4885KDM4E 2848/4885NFE2L2 1850/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.