SCHEMBL340292

SCHEMBL340292

COc1ccc(N(CC(=O)O)CC(=O)O)cc1

nearest known ligand 0.59

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 11/20 0.59
NFE2L2 Q16236 10/20 0.59
NPC1 O15118 2/20 0.49
RAB9A P51151 2/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
TP53 P04637 1/20 0.49
MAPT P10636 1/20 0.49
ESR2 Q92731 1/20 0.49
NOX1 Q9Y5S8 1/20 0.49
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
KDM4E B2RXH2 1/20 0.46
POLB P06746 1/20 0.46
PDE4B Q07343 1/20 0.46
LDHA P00338 1/20 0.46
MTNR1A P48039 1/20 0.45
MTNR1B P49286 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13645028 0.92 KEAP1 (0.52) KEAP1NFE2L2NPC1RAB9ASMN1; SMN2
SCHEMBL13603842 0.92 KEAP1 (0.52) KEAP1NFE2L2NPC1RAB9ASMN1; SMN2
SCHEMBL6172845 0.91 KEAP1 (0.55) KEAP1NFE2L2NPC1RAB9ASMN1; SMN2
SCHEMBL13645023 0.89 KEAP1 (0.50) KEAP1NFE2L2NPC1RAB9ASMN1; SMN2
SCHEMBL18612471 0.89 KEAP1 (0.50) KEAP1NFE2L2NPC1RAB9ASMN1; SMN2
SCHEMBL17975523 0.87 MTNR1A (0.52) KEAP1NFE2L2MTNR1AMTNR1B
SCHEMBL13603913 0.87 ALDH1A1 (0.58) NPC1RAB9ASMN1; SMN2TP53MAPT
SCHEMBL13644958 0.86 KEAP1 (0.51) KEAP1NFE2L2SMN1; SMN2
SCHEMBL6560868 0.85 NR3C1 (0.56) KEAP1NFE2L2NPC1RAB9ASMN1; SMN2
SCHEMBL16174068 0.85 PPARG (0.52) KEAP1NFE2L2NPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2011085445-A1 FLOTATION REAGENTS TEEBEE HOLDINGS PTY LTD (AU) 2011-07-21 WO claimed
US-20180118887-A1 PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PRECURSOR COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20180079864-A1 POLYIMIDE PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, A SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING POLYIMIDE PRECURSOR COMPOSITION FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
EP-1975707-B1 Curable composition and planographic printing plate precursor FUJIFILM CORP (JP) 2017-07-19 EP disclosed
EP-3162868-A1 THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2017-05-03 EP disclosed
EP-1801651-B1 Polymerizable composition and planographic printing plate precursor using the same FUJIFILM CORP (JP) 2017-04-19 EP disclosed
US-20170101521-A1 THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2017-04-13 US disclosed
WO-2017002859-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, CURED FILM PRODUCTION METHOD AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2017-01-05 WO disclosed
EP-1887423-B1 Laser-decomposable resin composition and pattern-forming material using the same FUJIFILM CORP (JP) 2016-01-27 EP disclosed
CN-102529310-B Original edition of lithographic printing plate and lithographic process FUJI FILM CORP. (JP) 2015-09-16 CN disclosed
EP-1079972-A1 IR-SENSITIVE COMPOSITION AND USE THEREOF FOR THE PREPARATION OF PRINTING PLATE PRECURSORS Kodak Polychrome Graphics Company Ltd. (US) 2001-03-07 EP disclosed
WO-2000048836-A1 IR-SENSITIVE COMPOSITION AND USE THEREOF FOR THE PREPARATION OF PRINTING PLATE PRECURSORS KODAK POLYCHROME GRAPHICS COMPANY, LTD. (US) 2000-08-24 WO disclosed
US-5942372-A COMPRISED A SPECTRAL SENSITIZER THAT SENSITIZES IN THE ULTRAVIOLET OR VISIBLE REGIONS OF THE SPECTRUM AND AN N-ARYL POLYCARBOXYLIC ACID CO-INITIATOR; VERY HIGH PHOTOSPEED AND VERY GOOD SHELF-LIFE IN COMPUTER-TO-PLATE SYSTEMS KODAK POLYCHROME GRAPHICS, LLC (US) 1999-08-24 US disclosed
US-5914215-A ELEMENT COMPRISING SUPPORT HAVING PHOTOIMAGEABLE, RADIATION SENSITIVE LAYER COMPRISING UNSATURATED COMPOUND, PHOTOINITIATOR SYSTEM COMPRISING SENSITIZER SENSITIZING IN ULTRAVIOLET OR VISIBLE REGION OF SPECTRUM, CO-INITIATOR KODAK POLYCHROME GRAPHIC, LLC (US) 1999-06-22 US disclosed
US-5888700-A NONFOGGING, SHELF LIFE KODAK POLYCHROME GRPAHICS, LLC (US) 1999-03-30 US disclosed
US-5821030-A DIRECT DIGITAL EXPOSURE; HIGH WRITING SPEED; ADHESION; ANTIFOGGING AGENTS; SHELF LIFE; USING A POLYCARBOXYLIC ACID IN THE PHOTOPOLYMERIZATION INITIATOR SYSTEM AND A BASIC COMPOUND IN THE OXYGEN BARRIER LAYER KODAK POLYCHROME GRAPHICS (US) 1998-10-13 US disclosed
US-5776655-A CONTAINING PHOTOPOLYMER EASTMAN KODAK COMPANY (US) 1998-07-07 US disclosed
EP-0795790-A2 Peel-developable lithographic printing plate EASTMAN KODAK COMPANY (US) 1997-09-17 EP disclosed
US-5629354-A Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator EASTMAN KODAK COMPANY (US) 1997-05-13 US disclosed
EP-0730201-A1 Sensitized photopolymerizable compositions and use thereof in lithographic printing plates EASTMAN KODAK COMPANY (US) 1996-09-04 EP disclosed