SCHEMBL3433969

SCHEMBL3433969

CCC(F)(F)C(F)(F)C(F)(F)S(=O)(=O)c1c(C(C)C)cccc1C(C)C

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.33
GABRA1 P14867 2/20 0.33
GABRG2 P18507 2/20 0.33
GABRB3 P28472 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
FAAH O00519 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
LMNA P02545 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
HPGD P15428 1/20 0.32
TSHR P16473 1/20 0.32
GABRB1 P18505 1/20 0.32
PTGS1 P23219 1/20 0.32
SLC6A2 P23975 1/20 0.32
HTR2C P28335 1/20 0.32
GABRA5 P31644 1/20 0.32
GABRA3 P34903 1/20 0.32
HTR2B P41595 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17208553 0.83 HSD11B1 (0.38) HSD11B1GABRA1GABRG2GABRB3L3MBTL1
SCHEMBL17210696 0.80 GABRA1 (0.36) HSD11B1GABRA1GABRG2GABRB3L3MBTL1
SCHEMBL15681901 0.78 SOAT2 (0.38)
SCHEMBL20133705 0.66 L3MBTL1 (0.40) HSD11B1GABRA1GABRG2GABRB3L3MBTL1
SCHEMBL20129738 0.66 L3MBTL1 (0.40) HSD11B1GABRA1GABRG2GABRB3L3MBTL1
SCHEMBL20073207 0.65 L3MBTL1 (0.42) GABRA1GABRG2GABRB3L3MBTL1FAAH
SCHEMBL12018664 0.65 SOAT2 (0.40)
SCHEMBL20129739 0.64 CA1 (0.44) GABRA1GABRG2GABRB3L3MBTL1FAAH
SCHEMBL20464062 0.64 GABRA1 (0.38) GABRA1GABRG2GABRB3
SCHEMBL16417730 0.64 FABP4 (0.56) GABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120094235-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-04-19 US disclosed