SCHEMBL3454428

SCHEMBL3454428

O=S(=O)([O-])CCO.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.36
CA12 O43570 2/20 0.36
CA9 Q16790 2/20 0.36
MEN1 O00255 2/20 0.36
LMNA P02545 2/20 0.36
GAA P10253 2/20 0.36
KMT2A Q03164 2/20 0.36
PABPC1 P11940 1/20 0.36
EIF4H Q15056 1/20 0.36
CTDSP1 Q9GZU7 1/20 0.36
KDM4E B2RXH2 1/20 0.36
ALDH1A1 P00352 1/20 0.36
GLA P06280 1/20 0.36
HTT P42858 1/20 0.36
HSD11B1 P28845 1/20 0.33
TP53 P04637 1/20 0.32
HPGD P15428 1/20 0.32
ALOX12 P18054 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3456114 0.89 PABPC1 (0.41) CA2CA12CA9GAAPABPC1
SCHEMBL2437125 0.88 CA12 (0.41) CA2CA12CA9GAAPABPC1
Eprodisate SCHEMBL217819 0.84 PABPC1 (0.45) CA2CA12CA9LMNAGAA
SCHEMBL6652819 0.81 CA12 (0.38) CA2CA12CA9GAAPABPC1
SCHEMBL218620 0.79 CA2 (0.41) CA2CA12CA9LMNAPABPC1
SCHEMBL4485964 0.79 PSIP1 (0.43) CA2CA12CA9LMNAHTT
Sulfuric Acid SCHEMBL5798237 0.79 TSHR (0.44) CA2CA12CA9MEN1KMT2A
Sulfuric Acid SCHEMBL5798230 0.79 HTR6 (0.39) CA2CA12CA9MEN1KMT2A
SCHEMBL217581 0.78 PABPC1 (0.41) CA2CA12CA9GAAPABPC1
SCHEMBL31321413 0.78 PABPC1 (0.38) CA2CA12CA9GAAPABPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8394570-B2 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-12 US disclosed
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS TYK2, VRK2, ARSA CA2 2503/4885CA12 3827/4885CA9 2877/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.