SCHEMBL6652819

SCHEMBL6652819

CCCS(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.38
CA2 P00918 2/20 0.38
CA9 Q16790 2/20 0.38
PSIP1 O75475 1/20 0.38
PABPC1 P11940 1/20 0.36
EIF4H Q15056 1/20 0.36
CTDSP1 Q9GZU7 1/20 0.36
GAA P10253 3/20 0.35
KDM4E B2RXH2 2/20 0.33
ALDH1A1 P00352 2/20 0.33
PKM P14618 1/20 0.33
HPGD P15428 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
RXFP1 Q9HBX9 1/20 0.33
CES2 O00748 1/20 0.32
CES1 P23141 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL217581 0.89 PABPC1 (0.41) CA12CA2CA9PSIP1PABPC1
SCHEMBL2437125 0.88 CA12 (0.41) CA12CA2CA9PSIP1PABPC1
SCHEMBL4485964 0.88 PSIP1 (0.43) CA12CA2CA9PSIP1CES2
SCHEMBL7575479 0.87 ALDH1A1 (0.38) CA2KDM4EALDH1A1
SCHEMBL7584253 0.87 CA12 (0.37) CA12CA2CA9PSIP1PABPC1
SCHEMBL453413 0.86 CES2 (0.39) PABPC1EIF4HCTDSP1CES2CES1
SCHEMBL1664173 0.86 CES2 (0.39) PABPC1EIF4HCTDSP1CES2CES1
Eprodisate SCHEMBL217819 0.84 PABPC1 (0.45) CA12CA2CA9PABPC1EIF4H
SCHEMBL8317869 0.84 PABPC1 (0.33) PABPC1EIF4HCTDSP1ALDH1A1
SCHEMBL7574532 0.83 ALDH1A1 (0.41) CA12CA2CA9GAAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1434091-A1 CHEMICAL-AMPLIFICATION-TYPE POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION Clariant International Ltd. (CH) 2004-06-30 EP disclosed
CN-1478220-A Chemically amplified positive radiation-sensitive resin composition ���Ͽع����޹�˾ 2004-02-25 CN disclosed
US-20040033438-A1 Chemical-amplication-type positive radiation-sensitive resin composition AZ ELECTRONIC MATERIALS USA CORP. 2004-02-19 US disclosed
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed
US-6358665-B1 ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE CLARIANT INTERNATIONAL LTD. (CH) 2002-03-19 US disclosed
EP-1033624-A1 RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE Clariant International Ltd. (CH) 2000-09-06 EP disclosed