SCHEMBL352013

SCHEMBL352013

C=CCOCC(=C)C(=O)OCC(c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.40
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA9 Q16790 1/20 0.39
CYP2C19 P33261 1/20 0.39
ALDH1A1 P00352 3/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
PKM P14618 2/20 0.36
CYP2D6 P10635 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
NPSR1 Q6W5P4 2/20 0.36
POLB P06746 1/20 0.36
APOBEC3A P31941 1/20 0.36
CASP6 P55212 1/20 0.36
APOBEC3G Q9HC16 1/20 0.36
CYP1A2 P05177 1/20 0.36
TSHR P16473 1/20 0.35
HSD17B10 Q99714 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL350184 0.83 CYP2C19 (0.41) CYP3A4CYP2C19ALDH1A1SMN1; SMN2PKM
SCHEMBL350916 0.80 ALDH1A1 (0.44) CYP3A4CA12CA9ALDH1A1SMN1; SMN2
SCHEMBL352190 0.77 THRB (0.55) CYP3A4ALDH1A1SMN1; SMN2PKMMEN1
SCHEMBL19837889 0.77 MMP1 (0.43) CYP3A4ALDH1A1SMN1; SMN2MEN1KMT2A
SCHEMBL19837888 0.77 MMP1 (0.43) CYP3A4ALDH1A1SMN1; SMN2MEN1KMT2A
SCHEMBL351044 0.77 CYP3A4 (0.40) CYP3A4ALDH1A1SMN1; SMN2PKMMEN1
SCHEMBL353515 0.76 TDP1 (0.34) CA1CA2CA9TSHR
SCHEMBL352661 0.76 TDP1 (0.34) CA1CA2CA9TSHR
SCHEMBL351176 0.76 TDP1 (0.34) CA1CA2CA9TSHR
SCHEMBL30558865 0.75 THRB (0.42) CYP3A4CA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
CN-111542554-B Polymer, curable resin composition, and use thereof 株式会社日本触媒 2022-03-18 CN disclosed
CN-111542554-A Polymer, curable resin composition, and use thereof 株式会社日本触媒 2020-08-14 CN disclosed
WO-2020162475-A1 CURABLE RESIN COMPOSITION キヤノン株式会社 2020-08-13 WO disclosed
US-20180037758-A1 Ink Composition For Three-Dimensional Modeling, Ink Set, And Method For Producing Three-Dimensional Model Konica Minolta, Inc. (JP) 2018-02-08 US disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed