SCHEMBL353293

SCHEMBL353293

Cc1cc(O)c(C(C)C)cc1C(c1cc(C(C)C)c(O)cc1C)c1ccccc1O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.57
GABRB2 P47870 2/20 0.57
MAPT P10636 5/20 0.49
CYP1A2 P05177 4/20 0.49
CYP3A4 P08684 4/20 0.49
CYP2C19 P33261 3/20 0.49
HIF1A Q16665 3/20 0.49
KMT2A Q03164 3/20 0.49
CYP2D6 P10635 2/20 0.49
CYP2C9 P11712 2/20 0.49
ALOX15 P16050 2/20 0.49
PKM P14618 2/20 0.49
THRB P10828 1/20 0.49
LMNA P02545 6/20 0.49
ALDH1A1 P00352 4/20 0.44
GAA P10253 3/20 0.44
HTT P42858 1/20 0.44
HSD17B10 Q99714 1/20 0.44
NPSR1 Q6W5P4 3/20 0.43
MEN1 O00255 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36498 0.84 GABRA1 (0.47) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL29375135 0.84 GABRA1 (0.47) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL9615467 0.83 LMNA (0.49) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL1397171 0.82 GABRA1 (0.48) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL28532546 0.82 MAPT (0.60) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL28547074 0.81 ALDH1A1 (0.47) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL1245089 0.79 LMNA (0.65) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL30411784 0.79 LMNA (0.65) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL11425360 0.75 GABRA1 (0.54) GABRA1GABRB2MAPTCYP1A2CYP3A4
SCHEMBL3824782 0.75 LMNA (0.61) GABRA1GABRB2MAPTCYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8535873-B2 Photosensitive resin composition SHOWA DENKO K.K. (JP) 2013-09-17 US disclosed
US-20120015300-A1 PHOTOSENSITIVE RESIN COMPOSITION RESONAC CORPORATION (JP) 2012-01-19 US disclosed