Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 3/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.48 |
| ▸ | ATM | Q13315 | 1/20 | 0.48 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.47 |
| ▸ | CTSL | P07711 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | NAAA | Q02083 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9056702 | 1.00 | MGLL (0.51) | MGLLKMT2AHPGDMEN1LMNA | |
| SCHEMBL7719022 | 0.95 | KMT2A (0.54) | MGLLKMT2AHPGDMEN1LMNA | |
| SCHEMBL18684993 | 0.85 | ALDH1A1 (0.52) | KMT2AMEN1LMNATP53ALDH1A1 | |
| SCHEMBL17069421 | 0.84 | MGLL (0.49) | MGLLKMT2AHPGDMEN1LMNA | |
| SCHEMBL8082873 | 0.84 | GAA (0.51) | KMT2AHPGDMEN1LMNACTSL | |
| SCHEMBL31201187 | 0.84 | MGLL (0.49) | MGLLKMT2AHPGDMEN1LMNA | |
| SCHEMBL13172128 | 0.83 | ALDH1A1 (0.40) | MGLLKMT2AHPGDMEN1LMNA | |
| SCHEMBL8654472 | 0.81 | ALDH1A1 (0.50) | KMT2AHPGDMEN1ALDH1A1GAA | |
| SCHEMBL27889292 | 0.81 | CTSL (0.47) | KMT2AHPGDMEN1LMNACTSL | |
| SCHEMBL542087 | 0.80 | ALDH1A1 (0.49) | KMT2AHPGDMEN1ALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| WO-2008035890-A9 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2009-04-23 | — | — | WO | claimed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | claimed |
| EP-3374467-B1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC TECH AG (CH) | 2020-04-15 | — | — | EP | disclosed |
| US-20180320072-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | Rolic Technologies AG (CH) | 2018-11-08 | — | — | US | disclosed |
| EP-3374467-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC Technologies AG (CH) | 2018-09-19 | — | — | EP | disclosed |
| WO-2017080977-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC AG (CH) | 2017-05-18 | — | — | WO | disclosed |
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | disclosed |
| US-20100239962-A1 | TWO-PHOTON ABSORBING OPTICAL RECORDING MATERIAL AND TWO-PHOTON ABSORBING OPTICAL RECORDING AND REPRODUCING METHOD | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7771915-B2 | Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method | FUJIFILM CORPORATION (JP) | 2010-08-10 | — | — | US | disclosed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| US-7588863-B2 | Hologram recording method and hologram recording material | FUJIFILM CORPORATION (JP) | 2009-09-15 | — | — | US | disclosed |
| US-7582390-B2 | Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method | FUJIFILM CORPORATION (JP) | 2009-09-01 | — | — | US | disclosed |
| US-7582391-B2 | Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material | FUJIFILM CORPORATION (JP) | 2009-09-01 | — | — | US | disclosed |
| US-7531667-B2 | Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| WO-2008035890-A9 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2009-04-23 | — | — | WO | disclosed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | disclosed |
| EP-0633502-B1 | PATTERN FORMING MATERIAL | CLARIANT FINANCE BVI LTD (VG) | 2002-03-20 | — | — | EP | disclosed |
| EP-0633502-A1 | PATTERN FORMING MATERIAL | HOECHST JAPAN LIMITED (JP) | 1995-01-11 | — | — | EP | disclosed |