SCHEMBL9056702

SCHEMBL9056702

CCCCCCCCCCNC(=O)OC(C)c1ccccc1[N+](=O)[O-]

nearest known ligand 0.51

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 3/20 0.51
KMT2A Q03164 2/20 0.49
HPGD P15428 2/20 0.48
MEN1 O00255 1/20 0.48
LMNA P02545 1/20 0.48
TP53 P04637 1/20 0.48
HSP90AA1 P07900 1/20 0.48
ATM Q13315 1/20 0.48
PTGS2 P35354 1/20 0.47
CTSL P07711 1/20 0.46
ALDH1A1 P00352 1/20 0.46
GAA P10253 1/20 0.43
NAAA Q02083 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3619558 1.00 MGLL (0.51) MGLLKMT2AHPGDMEN1LMNA
SCHEMBL7719022 0.95 KMT2A (0.54) MGLLKMT2AHPGDMEN1LMNA
SCHEMBL18684993 0.85 ALDH1A1 (0.52) KMT2AMEN1LMNATP53ALDH1A1
SCHEMBL17069421 0.84 MGLL (0.49) MGLLKMT2AHPGDMEN1LMNA
SCHEMBL8082873 0.84 GAA (0.51) KMT2AHPGDMEN1LMNACTSL
SCHEMBL31201187 0.84 MGLL (0.49) MGLLKMT2AHPGDMEN1LMNA
SCHEMBL13172128 0.83 ALDH1A1 (0.40) MGLLKMT2AHPGDMEN1LMNA
SCHEMBL8654472 0.81 ALDH1A1 (0.50) KMT2AHPGDMEN1ALDH1A1GAA
SCHEMBL27889292 0.81 CTSL (0.47) KMT2AHPGDMEN1LMNACTSL
SCHEMBL542087 0.80 ALDH1A1 (0.49) KMT2AHPGDMEN1ALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3161061-B1 METHOD OF FORMING A PATTERNED THIN FILM COMPONENT AND ORGANIC THIN FILM TRANSISTOR FLEXTERRA INC (US) 2020-11-18 EP disclosed
CN-106663736-B Photopatternable composition, patterned high dielectric thin film dielectric and related devices 飞利斯有限公司 2020-01-17 CN disclosed
US-10409159-B2 Photopatternable compositions, patterned high k thin film dielectrics and related devices FLEXTERRA, INC. (US) 2019-09-10 US disclosed
US-20170192354-A1 PHOTOPATTERNABLE COMPOSITIONS, PATTERNED HIGH K THIN FILM DIELECTRICS AND RELATED DEVICES USINVEST LLC 2017-07-06 US disclosed
EP-3161061-A1 PHOTOPATTERNABLE COMPOSITIONS, PATTERNED HIGH K THIN FILM DIELECTRICS AND RELATED DEVICES Flexterra, Inc. (US) 2017-05-03 EP disclosed
EP-2960280-A1 Photocrosslinkable compositions, patterned high k thin film dielectrics and related devices E.T.C. S.r.l. (IT) 2015-12-30 EP disclosed
WO-2015200872-A1 PHOTOPATTERNABLE COMPOSITIONS, PATTERNED HIGH K THIN FILM DIELECTRICS AND RELATED DEVICES POLYERA CORPORATION (US) 2015-12-30 WO disclosed
US-5545509-A INTEGRATED CIRCUITS; HIGH DENSITY INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-08-13 US disclosed
EP-0599571-B1 Photoresist composition IBM (US) 1996-03-27 EP disclosed
EP-0599571-A2 Photoresist composition International Business Machines Corporation (US) 1994-06-01 EP disclosed