SCHEMBL3625543

SCHEMBL3625543

CCCCC(CO)(CO)C(C)C

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.35
SMN1; SMN2 Q16637 1/20 0.33
FDPS P14324 1/20 0.32
TSHR P16473 2/20 0.32
LMNA P02545 3/20 0.32
HSD17B10 Q99714 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
ESR1 P03372 1/20 0.30
ESR2 Q92731 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27144573 0.93 SMN1; SMN2 (0.38) ALDH1A1SMN1; SMN2FDPSTSHRLMNA
SCHEMBL18124696 0.91 ALDH1A1 (0.32) ALDH1A1SMN1; SMN2FDPSTSHR
SCHEMBL6398064 0.84 DPP4 (0.32) TSHR
SCHEMBL228952 0.83 ALDH1A1 (0.33) ALDH1A1SMN1; SMN2FDPSTSHRLMNA
SCHEMBL15501084 0.83 ALDH1A1 (0.33) ALDH1A1SMN1; SMN2FDPSTSHRLMNA
SCHEMBL29780386 0.81 ALDH1A1 (0.33) ALDH1A1SMN1; SMN2FDPSTSHR
SCHEMBL27145591 0.80 ALDH1A1 (0.38) ALDH1A1TSHRLMNAMEN1KMT2A
SCHEMBL406532 0.79 ALDH1A1 (0.31) ALDH1A1
SCHEMBL9236932 0.79 ALDH1A1 (0.31) ALDH1A1
SCHEMBL28438544 0.79 TSHR (0.32) FDPSTSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024204557-A1 COMPOSITION, REACTIVE DILUENT, CURABLE COMPOSITION, AND METHOD FOR PRODUCING COMPOSITION KHネオケム株式会社 2024-10-03 WO disclosed
US-9550763-B2 Heterocyclic ring and carbocyclic derivative SHIONOGI & CO., LTD. (JP) 2017-01-24 US disclosed
US-20160024072-A1 Heterocyclic Ring and Carbocyclic Derivative SHIONOGI & CO., LTD. (JP) 2016-01-28 US disclosed
EP-1980576-B1 PROPYLENE POLYMER, METHOD FOR PRODUCTION OF THE PROPYLENE POLYMER, PROPYLENE POLYMER COMPOSITION, AND MOLDED ARTICLE MANUFACTURED FROM THE COMPOSITION JAPAN POLYPROPYLENE CORP (JP) 2015-07-22 EP disclosed
US-8232358-B2 Propylene-based polymer and production method therefor, propylene-based polymer composition and molded body made thereof JAPAN POLYPROPYLENE CORPORATION (JP) 2012-07-31 US disclosed
US-7858716-B2 Polypropylene having high melt flow rate (MFR) value and excellent product qualities with high productivity and processibility; using a coordination catalyst including magnesium chloride, tetrabutyl titanate, dibutylphthalate;dimethylvinylsilane, diisopropyldimethoxysilane and anorganoaluminum compound JAPAN POLYPROPYLENE CORPORATION (JP) 2010-12-28 US disclosed
US-20100099811-A1 PROPYLENE-BASED POLYMER AND PRODUCTION METHOD THEREFOR, PROPYLENE-BASED POLYMER COMPOSITION AND MOLDED BODY MADE THEREOF JAPAN POLYPROPYLENE CORPORATION (JP) 2010-04-22 US disclosed
US-20090259006-A1 PROPYLENE POLYMER, METHOD FOR PRODUCTION OF THE PROPYLENE POLYMER, PROPYLENE POLYMER COMPOSITION, AND MOLDED ARTICLE MANUFACTURED FROM THE COMPOSITION JAPAN POLYPROPYLENE CORPORATION (JP) 2009-10-15 US disclosed
EP-1980576-A1 PROPYLENE POLYMER, METHOD FOR PRODUCTION OF THE PROPYLENE POLYMER, PROPYLENE POLYMER COMPOSITION, AND MOLDED ARTICLE MANUFACTURED FROM THE COMPOSITION Japan Polypropylene Corporation (JP) 2008-10-15 EP disclosed
US-20050053630-A1 Antiseptic/antifungal agent and endermic liniment composition which contains it SHISEIDO COMPANY LTD. (JP) 2005-03-10 US disclosed
EP-1201125-B1 Antiseptic/antifungal agent and endermic liniment composition which contains it SHISEIDO CO LTD (JP) 2003-12-17 EP disclosed
US-6620418-B1 Paraben-free antiseptic/antifungal composition which contains 3- methyl-3-methoxybutanol and 1,2-pentanediol in cosmetic form SHISEIDO COMPANY, LTD. (JP) 2003-09-16 US disclosed
EP-1040757-B1 Antiseptic/antifungal agent and endermic liniment composition which contains it SHISEIDO CO LTD (JP) 2003-02-05 EP disclosed
EP-1201125-A1 Antiseptic/antifungal agent and endermic liniment composition which contains it SHISEIDO COMPANY LIMITED (JP) 2002-05-02 EP disclosed
EP-1040757-A1 Antiseptic/antifungal agent and endermic liniment composition which contains it SHISEIDO COMPANY LIMITED (JP) 2000-10-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160024072-A1 Heterocyclic Ring and Carbocyclic Derivative P2RX3, P2RX7, P2RX2 ALDH1A1 2515/4885SMN1; SMN2 4746/4885FDPS 4552/4885
US-20050053630-A1 Antiseptic/antifungal agent and endermic liniment composition which contains it DPM1, POLR1C, DERL1 ALDH1A1 375/4885SMN1; SMN2 3532/4885FDPS 3779/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.