Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.56 |
| ▸ | CA2 | P00918 | 2/20 | 0.56 |
| ▸ | BCL2 | P10415 | 2/20 | 0.44 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.44 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.44 |
| ▸ | BCL2L2 | Q92843 | 2/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.40 |
| ▸ | ESR1 | P03372 | 2/20 | 0.40 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.40 |
| ▸ | LDHA | P00338 | 3/20 | 0.39 |
| ▸ | LDHB | P07195 | 3/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | ALB | P02768 | 4/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL758758 | 0.78 | CA1 (0.52) | CA1CA2PTGS1PTGS2CYP1A2 | |
| SCHEMBL6302922 | 0.77 | CA1 (0.70) | CA1CA2PTGS1CYP1A2GAA | |
| SCHEMBL30669856 | 0.77 | HSD17B1 (0.47) | BCL2BCL2L1MCL1BCL2L2PTGS1 | |
| SCHEMBL4598840 | 0.77 | HSD17B1 (0.47) | BCL2BCL2L1MCL1BCL2L2PTGS1 | |
| SCHEMBL6676697 | 0.77 | CA1 (0.41) | CA1CA2BCL2BCL2L1MCL1 | |
| SCHEMBL1885197 | 0.77 | CA1 (0.41) | CA1CA2BCL2BCL2L1MCL1 | |
| SCHEMBL29379546 | 0.75 | CA1 (0.68) | CA1CA2PTGS1ESR1PTGS2 | |
| SCHEMBL6847775 | 0.75 | GABRA1 (0.52) | CA1CA2PTGS1PTGS2CYP1A2 | |
| SCHEMBL27353893 | 0.75 | GABRA1 (0.54) | CA1CA2PTGS1PTGS2CYP1A2 | |
| SCHEMBL27813800 | 0.75 | CA1 (0.48) | CA1CA2BCL2BCL2L1MCL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103907058-A | Nanocomposite positive photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA | 2014-07-02 | — | — | CN | disclosed |
| CN-102520583-B | Photoresist compositions comprising acetals and ketals as solvents | AZ ELECTRONIC MATERIALS JAPAN | 2014-05-07 | — | — | CN | disclosed |
| CN-101809502-B | Thick film resists | AZ ELECTRONIC MATERIALS USA | 2014-01-08 | — | — | CN | disclosed |
| EP-1913444-B1 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ ELECTRONIC MATERIALS USA (US) | 2013-01-16 | — | — | EP | disclosed |
| EP-1497697-B1 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | AZ ELECTRONIC MATERIALS USA (US) | 2012-08-08 | — | — | EP | disclosed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | disclosed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | disclosed |
| EP-1609025-A2 | PHOTORESIST COMPOSITION FOR THE FORMATION OF THICK FILMS | AZ Electronic Materials USA Corp. (US) | 2005-12-28 | — | — | EP | disclosed |
| US-6911293-B2 | Photoresist compositions comprising acetals and ketals as solvents | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-28 | — | — | US | disclosed |
| US-6852465-B2 | Photoresist composition for imaging thick films | CLARIANT INTERNATIONAL LTD. (CH) | 2005-02-08 | — | — | US | disclosed |
| US-20040185368-A1 | Photoresist composition for imaging thick films | MERCK PATENT GMBH (DE) | 2004-09-23 | — | — | US | disclosed |
| US-6733949-B2 | ACID AND ALKALI ETCHING RESISTANT PROTECTIVE LAYER; IMAGE FORMATION OF MICROELECTRONIC DEVICE | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-05-11 | — | — | US | disclosed |
| US-20030207195-A1 | NOVOLAK RESIN MIXTURES AND PHOTOSENSITIVE COMPOSITIONS COMPRISING THE SAME | AZ ELECTRONIC MATERIALS USA CORP. | 2003-11-06 | — | — | US | disclosed |
| US-20030194636-A1 | Novolak resin or polyhydroxystyrene; photoactive compound or photoacid generator | MERCK PATENT GMBH (DE) | 2003-10-16 | — | — | US | disclosed |
| WO-2003085455-A2 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | CLARIANT INTERNATIONAL LTD (CH) | 2003-10-16 | — | — | WO | disclosed |
| EP-1064313-A4 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | ARCH SPEC CHEM INC (US) | 2001-06-13 | — | — | EP | disclosed |
| EP-1064313-A1 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-01-03 | — | — | EP | disclosed |
| US-5985507-A | PHOTORESISTS WITH THERMAL PROPERTIES | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-11-16 | — | — | US | disclosed |
| WO-1999042507-A1 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-08-26 | — | — | WO | disclosed |
| US-5674657-A | PHENOLIC RESIN COPOLYMER COMPRISING META-CRESOL, PARA-CRESOL AND OTHER PHENOLIC MONOMER SELECTED FROM XYLENOLS, METHOXYPHENOLS; RADIATION SENSITIVITY | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1997-10-07 | — | — | US | disclosed |