Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 5/20 | 0.48 |
| ▸ | SIGMAR1 | Q99720 | 4/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.48 |
| ▸ | MAOA | P21397 | 1/20 | 0.48 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.48 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.48 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.48 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.48 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.48 |
| ▸ | SLC18A2 | Q05940 | 1/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.44 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.44 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14667580 | 0.80 | SIGMAR1 (0.54) | TAAR1SIGMAR1SLC6A2MAOASLC6A4 | |
| SCHEMBL10949961 | 0.80 | TAAR1 (0.54) | TAAR1SIGMAR1SLC6A2MAOASLC6A4 | |
| SCHEMBL1357677 | 0.78 | TAAR1 (0.46) | TAAR1SIGMAR1SLC6A2MAOASLC6A4 | |
| SCHEMBL14667804 | 0.75 | SIGMAR1 (0.48) | TAAR1SIGMAR1SLC6A2MAOASLC6A4 | |
| SCHEMBL1356946 | 0.75 | SLC6A2 (0.48) | TAAR1SIGMAR1SLC6A2MAOASLC6A4 | |
| SCHEMBL3495199 | 0.75 | TRPA1 (0.50) | TAAR1SIGMAR1SLC6A2MAOASLC6A4 | |
| SCHEMBL412663 | 0.75 | SIGMAR1 (0.58) | TAAR1SIGMAR1SLC6A2MAOASLC6A4 | |
| SCHEMBL207297 | 0.75 | TAAR1 (0.58) | TAAR1SIGMAR1SLC6A2MAOASLC6A4 | |
| SCHEMBL24328238 | 0.75 | SRR (0.62) | — | |
| SCHEMBL8023124 | 0.75 | SRR (0.62) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102870047-B | Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof | JSR CORP. (JP) | 2016-03-02 | — | — | CN | disclosed |
| CN-102870045-B | Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same | JSR CORP | 2014-11-19 | — | — | CN | disclosed |
| CN-102213918-B | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2014-07-16 | — | — | CN | disclosed |
| CN-102967970-A | Array substrate, liquid display element, and method for manufacturing array subsrtate | JSR CORP | 2013-03-13 | — | — | CN | disclosed |
| CN-102870047-A | Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same | JSR CORP | 2013-01-09 | — | — | CN | disclosed |
| CN-102870045-A | Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same | JSR CORP | 2013-01-09 | — | — | CN | disclosed |
| CN-102859439-A | Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same | JSR CORP | 2013-01-02 | — | — | CN | disclosed |
| WO-2012007008-A1 | INHIBITORS OF HDME | EPITHERAPEUTICS APS (DK) | 2012-01-19 | — | — | WO | disclosed |
| CN-101025567-B | Radiation-sensitive resin composition, method for forming spacer and spacer | JSR CO., LTD. (JP) | 2011-12-14 | — | — | CN | disclosed |
| US-20110281040-A1 | LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF | JSR CORPORATION (JP) | 2011-11-17 | — | — | US | disclosed |
| CN-102243386-A | Liquid crystal display device, positive radiation-sensitive composition, interlayer insulating film for liquid crystal display device and method for forming the same | JSR CORP | 2011-11-16 | — | — | CN | disclosed |
| CN-102221781-A | Positive radiation sensitive composition, interlayer insulation film and forming method thereof | JSR CORP | 2011-10-19 | — | — | CN | disclosed |
| CN-102221782-A | Positive radiation sensitive composition, interlayer insulation film and forming method thereof | JSR CORP | 2011-10-19 | — | — | CN | disclosed |
| CN-102213918-A | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2011-10-12 | — | — | CN | disclosed |
| US-7749678-B2 | contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure | FUJIFILM CORPORATION (JP) | 2010-07-06 | — | — | US | disclosed |
| CN-101025567-A | Radiation-sensitive resin composition, method for forming spacer and spacer | JSR CORP (JP) | 2007-08-29 | — | — | CN | disclosed |
| US-20050233242-A1 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2005-10-20 | — | — | US | disclosed |
| EP-0793144-B1 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |