Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.68 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.68 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.52 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.52 |
| ▸ | BCHE | P06276 | 1/20 | 0.52 |
| ▸ | ACHE | P22303 | 1/20 | 0.52 |
| ▸ | TP53 | P04637 | 2/20 | 0.48 |
| ▸ | NCOA1 | Q15788 | 2/20 | 0.44 |
| ▸ | NCOA3 | Q9Y6Q9 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.43 |
| ▸ | CASP1 | P29466 | 1/20 | 0.43 |
| ▸ | CASP7 | P55210 | 1/20 | 0.43 |
| ▸ | PRKCZ | Q05513 | 1/20 | 0.42 |
| ▸ | DHFR | P00374 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL34563 | 1.00 | ALDH1A1 (0.68) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| SCHEMBL29510158 | 0.97 | ALDH1A1 (0.71) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| SCHEMBL599657 | 0.97 | ALDH1A1 (0.71) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| SCHEMBL31264297 | 0.95 | ALDH1A1 (0.68) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| Methane SCHEMBL3050883 | 0.95 | ALDH1A1 (0.68) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| SCHEMBL29471400 | 0.95 | ALDH1A1 (0.68) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| SCHEMBL7141191 | 0.95 | ALDH1A1 (0.68) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| Water SCHEMBL2446952 | 0.95 | ALDH1A1 (0.68) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| Biphenyl-4-Amine SCHEMBL6081432 | 0.91 | ALDH1A1 (0.77) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 | |
| Benzidine SCHEMBL28123514 | 0.91 | ALDH1A1 (0.77) | ALDH1A1HSD17B10L3MBTL1CYP3A4TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118210196-A | Photosensitive resin composition, cured film pattern and method for producing the same | 奇美实业股份有限公司 | 2024-06-18 | — | — | CN | disclosed |
| WO-2024111131-A1 | POLYAMIC ACID ESTER AND RESIN COMPOSITION | ＨＤマイクロシステムズ株式会社 | 2024-05-30 | — | — | WO | disclosed |
| WO-2024111129-A1 | METHOD FOR PRODUCING POLYIMIDE PRECURSOR, POLYIMIDE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING PATTERN CURED PRODUCT, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2024-05-30 | — | — | WO | disclosed |
| WO-2024111130-A1 | POLYAMIC ACID ESTER AND RESIN COMPOSITION | ＨＤマイクロシステムズ株式会社 | 2024-05-30 | — | — | WO | disclosed |
| WO-2024095573-A1 | POLYIMIDE PRECURSOR AND RESIN COMPOSITION | ＨＤマイクロシステムズ株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024084636-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING PATTERNED CURED PRODUCT, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2024-04-25 | — | — | WO | disclosed |
| CN-117677672-A | Resin composition and insulated wire | 住友电气工业株式会社 | 2024-03-08 | — | — | CN | disclosed |
| US-20240018306-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, CURED PRODUCT, SEMICONDUCTOR DEVICE, AND METHOD FOR SYNTHESIZING POLYIMIDE PRECURSOR | RESONAC CORPORATION (JP) | 2024-01-18 | — | — | US | disclosed |
| US-11226560-B2 | Photosensitive resin composition, cured pattern production method, cured product, interlayer insulating film, cover coat layer, surface protective layer, and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2022-01-18 | — | — | US | disclosed |
| US-11021572-B2 | Photosensitive resin composition, cured product of same, interlayer insulating film, surface protective film and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20130189622-A1 | BLOCK COPOLYMER OF POLYMIDE AND POLYAMIC ACID, METHOD FOR PRODUCING THE BLOCK COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE BLOCK COPOLYMER AND PROTECTIVE FILM FORMED USING THE BLOCK COPOLYMER | LG CHEM, LTD. (KR) | 2013-07-25 | — | — | US | disclosed |
| US-20100069520-A1 | Block copolymer of polyimide and polyamic acid, method for producing the block copolymer, photosensitive resin composition comprising the block copolymer and protective film formed using the block copolymer | LG CHEM, LTD. (KR) | 2010-03-18 | — | — | US | disclosed |
| US-7521511-B2 | Thermosetting resin composition, multilayer body using same, and circuit board | KANEKA CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20080306220-A1 | Thermosetting Resin Composition, Multilayer Body Using Same, and Circuit Board | KANEKA CORPORATION (JP) | 2008-12-11 | — | — | US | disclosed |
| US-20060205891-A1 | Thermosetting resin composition, multilayer body using same, and circuit board | KANEKA CORPORATION (JP) | 2006-09-14 | — | — | US | disclosed |
| EP-0940724-B1 | Use of a solution for developing a photosensitive polyimide precursor, and method of patterning | HITACHI CHEM DUPONT MICROSYS (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6146815-A | Developer for photosensitive polyimide precursor, and method of using it for patterning | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. (US) | 2000-11-14 | — | — | US | disclosed |
| EP-0940724-A2 | Developer for photosensitive polyimide precursor, and method of using it for patterning | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 1999-09-08 | — | — | EP | disclosed |
| US-4520186-A | IMPROVING MECHANICAL PROPERTIES OF ELASTOMERS | BAYER AKTIENGESELLSCHAFT (DE) | 1985-05-28 | — | — | US | disclosed |
| US-4276386-A | LIQUID AT ROOM TEMPERATURE OR LIQUEFIABLE BY GENTLE HEATING | BAYER AKTIENGESELLSCHAFT (US) | 1981-06-30 | — | — | US | disclosed |