Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 3/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | CRHBP | P24387 | 1/20 | 0.32 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.32 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | JAK2 | O60674 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7030898 | 0.75 | EPHX2 (0.34) | EPHX2EPHX1LMNAALDH1A1THRB | |
| SCHEMBL927164 | 0.73 | P2RX7 (0.42) | EPHX2EPHX1LMNAALDH1A1THRB | |
| SCHEMBL26217909 | 0.71 | THRB (0.35) | EPHX2EPHX1HTTALDH1A1THRB | |
| SCHEMBL74823 | 0.71 | THRB (0.35) | EPHX2EPHX1HTTALDH1A1THRB | |
| SCHEMBL1578432 | 0.69 | ALDH1A1 (0.37) | EPHX2EPHX1HTTLMNAALDH1A1 | |
| SCHEMBL6859431 | 0.69 | EPHX2 (0.33) | EPHX2EPHX1ALDH1A1THRBCYP2C9 | |
| Hydrochloric Acid SCHEMBL3683456 | 0.69 | THRB (0.34) | EPHX2EPHX1LMNAALDH1A1THRB | |
| SCHEMBL7587941 | 0.67 | HSD11B1 (0.35) | HTTLMNAALDH1A1CRHBPCRHR2 | |
| SCHEMBL905306 | 0.67 | THRB (0.39) | EPHX2EPHX1HTTLMNAALDH1A1 | |
| SCHEMBL27750790 | 0.67 | THRB (0.35) | EPHX2EPHX1HTTLMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3363845-B1 | POLYAMIDE-IMIDE | LG CHEMICAL LTD (KR) | 2023-08-30 | — | — | EP | disclosed |
| EP-3736305-B1 | POLYAMIDE-IMIDE, METHOD FOR PREPARING SAME, AND POLYAMIDE-IMIDE FILM USING SAME | LG CHEMICAL LTD (KR) | 2022-01-05 | — | — | EP | disclosed |
| EP-3450482-B1 | HIGH-STRENGTH TRANSPARENT POLYAMIDE-IMIDE AND METHOD FOR MANUFACTURING SAME | LG CHEMICAL LTD (KR) | 2021-03-03 | — | — | EP | disclosed |
| EP-3736305-A1 | POLYAMIDE-IMIDE, METHOD FOR PREPARING SAME, AND POLYAMIDE-IMIDE FILM USING SAME | LG CHEM, LTD. (KR) | 2020-11-11 | — | — | EP | disclosed |
| CN-108431090-B | High-strength transparent polyamide-imide and method for producing same | 株式会社LG化学 | 2020-08-28 | — | — | CN | disclosed |
| EP-3366726-B1 | HIGH-STRENGTH TRANSPARENT POLYAMIDIMIDE AND METHOD FOR PREPARING SAME | LG CHEMICAL LTD (KR) | 2019-07-03 | — | — | EP | disclosed |
| US-20190023846-A1 | HIGH STRENGTH TRANSPARENT POLYAMIDE-IMIDE AND METHOD FOR PREPARING SAME | LG CHEM, LTD. (KR) | 2019-01-24 | — | — | US | disclosed |
| US-20190016849-A1 | POLYAMIDE-IMIDE, METHOD FOR PREPARING SAME, AND POLYAMIDE-IMIDE FILM USING SAME | LG CHEM, LTD. (KR) | 2019-01-17 | — | — | US | disclosed |
| US-20190010292-A1 | HIGH-STRENGTH TRANSPARENT POLYAMIDE-IMIDE AND METHOD FOR MANUFACTURING SAME | LG CHEM, LTD. (KR) | 2019-01-10 | — | — | US | disclosed |
| EP-3366726-A1 | HIGH-STRENGTH TRANSPARENT POLYAMIDIMIDE AND METHOD FOR PREPARING SAME | LG Chem, Ltd. (KR) | 2018-08-29 | — | — | EP | disclosed |
| US-6824957-B2 | RESIST COMPOSITION HAVING HIGH TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND HIGH DRY- ETCHING RESISTANCE, CAPABLE OF FORMING A RESIST PATTERN EXCELLENT IN ADHESION AND RESOLUTION BY MEANS OF ALKALI DEVELOPMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-11-30 | — | — | US | disclosed |
| US-6794528-B2 | HEAT RESISTANCE, FLAME RETARDERS, STABILIZERS; REACTING DIALCOHOL COMPOUND WITH A PHOSPHYL OXYCHLORIDE COMPOUND | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-09-21 | — | — | US | disclosed |
| US-20040043324-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-03-04 | — | — | US | disclosed |
| US-6660450-B2 | Acrylic ester polymer having pendant adamantane rings with oxygenated substitution; ultraviolet light transparency; dry etching resistance | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-09 | — | — | US | disclosed |
| US-20030149225-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-08-07 | — | — | US | disclosed |
| US-20030109736-A1 | Phosphorus compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-06-12 | — | — | US | disclosed |
| US-6541597-B2 | Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-04-01 | — | — | US | disclosed |
| EP-1277758-A1 | PHOSPHORUS COMPOUND | Daicel Chemical Industries, Ltd. (JP) | 2003-01-22 | — | — | EP | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030109736-A1 | Phosphorus compound | NR4A1, POLL, NR0B1 | EPHX2 3620/4885EPHX1 3912/4885HTT 2186/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.