Hypochlorous Acid

Hypochlorous Acid

SCHEMBL3693372

O.OCl

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Hypochlorous Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024242468-A1 METHOD FOR PREPARING REMIMAZOLAM BESYLATE WITH HIGH EFFICIENCY 하나제약 주식회사 2024-11-28 WO claimed
US-20230261268-A1 Acidic Surface Treatment for Multivalent Battery Metal Anode THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY 2023-08-17 US claimed
US-10947124-B2 Concentrated aqueous solutions of aluminum chlorohydrate monohydrate USALCO, LLC (US) 2021-03-16 US claimed
EP-3621921-A1 CONCENTRATED AQUEOUS SOLUTIONS OF ALUMINUM CHLOROHYDRATE MONOHYDRATE Usalco LLC (US) 2020-03-18 EP claimed
WO-2018209204-A1 CONCENTRATED AQUEOUS SOLUTIONS OF ALUMINUM CHLOROHYDRATE MONOHYDRATE USALCO, LLC (US) 2018-11-15 WO claimed
US-20180290895-A1 Concentrated Aqueous Solutions of Aluminum Chlorohydrate Monohydrate GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT 2018-10-11 US claimed
US-8309508-B2 Fibrous substrate with a solid hypohalite precipitate formed therein THE CLOROX COMPANY (US) 2012-11-13 US claimed
CN-102675193-A Novel synthesis method of Nevirapine key intermediate 2-chloro-3-amino-4-methylpyridine SHANGHAI SYNCORES TECHNOLOGIES INC 2012-09-19 CN claimed
US-8268770-B2 Fibrous substrate with a solid hypohalite precipitate formed therein and process of making THE CLOROX COMPANY (US) 2012-09-18 US claimed
US-20120141568-A1 FIBROUS SUBSTRATE WITH A SOLID HYPOHALITE PRECIPITATE FORMED THEREIN AND PROCESS OF MAKING THE CLOROX COMPANY (US) 2012-06-07 US claimed
US-20120137459-A1 FIBROUS SUBSTRATE WITH A SOLID HYPOHALITE PRECIPITATE FORMED THEREIN AND PROCESS OF MAKING THE CLOROX COMPANY 2012-06-07 US claimed
EP-0350556-A2 Continuous process for the manufacture of a hypochlorite bleaching composition HENKEL IBERICA, S.A. (ES) 1990-01-17 EP claimed
CN-113891882-B Process for producing dihydroisoxazole 组合化学工业株式会社 2024-11-26 CN disclosed
EP-3930681-B1 STABILISED HYPOCHLOROUS SOLUTIONS AND THEIR MEDICAL AND COSMETIC USES CLINICAL HEALTH TECH LTD (GB) 2024-01-24 EP disclosed
US-20230261268-A1 Acidic Surface Treatment for Multivalent Battery Metal Anode THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY 2023-08-17 US disclosed
US-20230261268-A1 Acidic Surface Treatment for Multivalent Battery Metal Anode THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY 2023-08-17 US disclosed
EP-0350556-A2 Continuous process for the manufacture of a hypochlorite bleaching composition HENKEL IBERICA, S.A. (ES) 1990-01-17 EP disclosed
EP-0350556-A2 Continuous process for the manufacture of a hypochlorite bleaching composition HENKEL IBERICA, S.A. (ES) 1990-01-17 EP disclosed
US-4631267-A POROUS OXIDES, PERMANENT AND TEMPORARY BINDERS MIXTURE; LOW TEMPERATURE FIRING CORNING GLASS WORKS (US) 1986-12-23 US disclosed
US-4380533-A Process for the production of dibasic magnesium hypochlorite OLIN CORPORATION (US) 1983-04-19 US disclosed