SCHEMBL371252

SCHEMBL371252

CC(=O)c1ccc(N2C(=O)C=CC2=O)cc1

nearest known ligand 0.68

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
DDAH1 O94760 1/20 0.68
MGLL Q99685 14/20 0.62
FAAH O00519 5/20 0.62
HSP90AA1 P07900 2/20 0.59
NPSR1 Q6W5P4 2/20 0.59
TDP1 Q9NUW8 2/20 0.59
ALDH1A1 P00352 1/20 0.59
HPGD P15428 1/20 0.59
HTT P42858 1/20 0.59
CACNA1B Q00975 1/20 0.59
APBA1 Q02410 1/20 0.59
KMT2A Q03164 2/20 0.58
PKM P14618 1/20 0.57
MAPK1 P28482 1/20 0.57
ADAM17 P78536 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28822042 0.88 DDAH1 (0.54) DDAH1MGLLFAAHHSP90AA1NPSR1
SCHEMBL331470 0.83 DDAH1 (0.73) DDAH1MGLLFAAHHSP90AA1NPSR1
SCHEMBL10332258 0.82 MGLL (0.61) DDAH1MGLLFAAHHSP90AA1NPSR1
SCHEMBL235166 0.81 DDAH1 (1.00) DDAH1MGLLFAAHHSP90AA1NPSR1
SCHEMBL11009175 0.80 DDAH1 (0.58) DDAH1MGLLFAAHHSP90AA1NPSR1
SCHEMBL11009171 0.80 DDAH1 (0.58) DDAH1MGLLFAAHHSP90AA1NPSR1
SCHEMBL1822680 0.79 DDAH1 (0.96) DDAH1MGLLFAAHHSP90AA1NPSR1
SCHEMBL8463151 0.79 DDAH1 (0.68) DDAH1MGLLFAAHHSP90AA1NPSR1
SCHEMBL398038 0.79 DDAH1 (0.68) DDAH1MGLLFAAHHSP90AA1NPSR1
Hydrochloric Acid SCHEMBL9278333 0.79 DDAH1 (0.96) DDAH1MGLLFAAHHSP90AA1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 275 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119391128-A Polyoxymethylene composition, polyoxymethylene material and preparation method thereof 国家能源集团宁夏煤业有限责任公司 2025-02-07 CN claimed
EP-3632941-B1 RESIN COMPOSITION CUBICURE GMBH (AT) 2023-08-23 EP claimed
US-8513350-B2 Forming patterned film; radiation transparent, reduced dielectrics, solvent resistance, waterproofing, acid and alkali resistance, heat resistance, adhesives properties to substrate JNC CORPORATION (JP) 2013-08-20 US claimed
EP-2373715-A2 OMEGA-FUNCTIONALIZED POLYMERS, JUNCTION-FUNCTIONALIZED BLOCK COPOLYMERS, POLYMER BIOCONJUGATES, AND RADICAL CHAIN EXTENSION POLYMERIZATION University Of Washington (US) 2011-10-12 EP claimed
WO-2010077678-A2 OMEGA-FUNCTIONALIZED POLYMERS, JUNCTION-FUNCTIONALIZED BLOCK COPOLYMERS, POLYMER BIOCONJUGATES, AND RADICAL CHAIN EXTENSION POLYMERIZATION UNIVERSITY OF WASHINGTON (US) 2010-07-08 WO claimed
US-20090191386-A1 POSITIVE PHOTOSENSITIVE POLYMER COMPOSITION CHISSO CORPORATION (JP) 2009-07-30 US claimed
US-20080207807-A1 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION CHISSO CORPORATION (JP) 2008-08-28 US claimed
EP-1608689-A1 REMOVAL OF THIOCARBONYL END GROUPS OF POLYMERS Symyx Technologies, Inc. (US) 2005-12-28 EP claimed
US-6919409-B2 Removal of the thiocarbonylthio or thiophosphorylthio end group of polymers and further functionalization thereof SYMYX TECHNOLOGIES, INC. (US) 2005-07-19 US claimed
US-20040266953-A1 Removal of the thiocarbonylthio or thiophosphorylthio end group of polymers and further functionalization thereof SYMYX TECHNOLOGIES, INC. 2004-12-30 US claimed
WO-2004089994-A1 REMOVAL OF THIOCARBONYL END GROUPS OF POLYMERS SYMYX TECHNOLOGIES, INC. (US) 2004-10-21 WO claimed
US-12504687-B2 Curable photosensitive resin composition, cured product, resist pattern, method of producing resist pattern, semiconductor device and electronic device ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 2025-12-23 US disclosed
US-12378284-B2 Compositions and methods for the delivery of nucleic acids CASE WESTERN RESERVE UNIVERSITY (US) 2025-08-05 US disclosed
US-20250201845-A1 POWDERY BINDER FOR SECONDARY BATTERY POSITIVE ELECTRODE AND USE OF SAME TOAGOSEI CO., LTD. (JP) 2025-06-19 US disclosed
US-20250188025-A1 COMPOSITIONS AND METHODS FOR THE DELIVERY OF NUCLEIC ACIDS UNIV CASE WESTERN RESERVE (US) 2025-06-12 US disclosed
EP-0035760-B1 THERMOSETTING RESIN COMPOSITION, PROCESS FOR PREPARATION THEREOF AND CURED PRODUCT THEREOF Hitachi, Ltd. (JP) 1985-07-03 EP disclosed
US-4393177-A POLY (PHENYLMETHYLENE) POLYMALEIMIDE AND TRIALLYL ISOCYANURATE HITACHI, LTD. (JP) 1983-07-12 US disclosed
EP-0035760-A2 Thermosetting resin composition, process for preparation thereof and cured product thereof Hitachi, Ltd. (JP) 1981-09-16 EP disclosed
EP-0001997-B1 ELECTRON BEAM-CURABLE PHOTORESIST LACQUERS BAYER AG (DE) 1981-02-11 EP disclosed
EP-0001997-A1 Electron beam-curable photoresist lacquers BAYER AG (DE) 1979-05-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250188025-A1 COMPOSITIONS AND METHODS FOR THE DELIVERY OF NUCLEIC ACIDS RBP4, RBP1, RARB DDAH1 2131/4885MGLL 4024/4885FAAH 3405/4885
US-12378284-B2 Compositions and methods for the delivery of nucleic acids HNRNPAB, SNRPA, SNRPE DDAH1 3093/4885MGLL 3908/4885FAAH 4644/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.