Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.40 |
| ▸ | TET3 | O43151 | 3/20 | 0.40 |
| ▸ | FBXL19 | Q6PCT2 | 3/20 | 0.40 |
| ▸ | CXXC5 | Q7LFL8 | 3/20 | 0.40 |
| ▸ | KDM2B | Q8NHM5 | 3/20 | 0.40 |
| ▸ | CXXC4 | Q9H2H0 | 3/20 | 0.40 |
| ▸ | KDM2A | Q9Y2K7 | 3/20 | 0.40 |
| ▸ | TET1 | Q8NFU7 | 2/20 | 0.40 |
| ▸ | FAAH | O00519 | 1/20 | 0.38 |
| ▸ | PHGDH | O43175 | 1/20 | 0.38 |
| ▸ | MGLL | Q99685 | 1/20 | 0.38 |
| ▸ | RYR2 | Q92736 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.37 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.36 |
| ▸ | DPP4 | P27487 | 1/20 | 0.34 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23221883 | 0.92 | KMT2A (0.36) | KMT2ATET3FBXL19CXXC5KDM2B | |
| SCHEMBL10233868 | 0.86 | — | — | |
| SCHEMBL237862 | 0.84 | — | — | |
| SCHEMBL167151 | 0.84 | TET3 (0.47) | KMT2ATET3FBXL19CXXC5KDM2B | |
| SCHEMBL12764449 | 0.84 | TET3 (0.47) | KMT2ATET3FBXL19CXXC5KDM2B | |
| SCHEMBL20547259 | 0.84 | TET3 (0.47) | KMT2ATET3FBXL19CXXC5KDM2B | |
| SCHEMBL5620994 | 0.78 | FAAH (0.39) | KMT2AFAAHPHGDHMGLLHPGD | |
| SCHEMBL149678 | 0.77 | — | — | |
| SCHEMBL505654 | 0.77 | ALDH1A1 (0.48) | KMT2ATET3FBXL19CXXC5KDM2B | |
| Vinyl Chloride SCHEMBL11122339 | 0.77 | TET3 (0.43) | KMT2ATET3FBXL19CXXC5KDM2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 207 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9128460-B2 | Photopolymer composition for recording hologram, and photopolymer layer and hologram recording media including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-09-08 | — | — | US | claimed |
| US-20140127611-A1 | PHOTOPOLYMER COMPOSITION FOR RECORDING HOLOGRAM, AND PHOTOPOLYMER LAYER AND HOLOGRAM RECORDING MEDIA INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-05-08 | — | — | US | claimed |
| US-12624172-B2 | Method for producing wetting agent for semiconductor, containing polyvinyl alcohol composition, polishing composition containing wetting agent for semiconductor, obtained by the production method, and method for producing polishing composition | FUJIMI INCORPORATED (JP) | 2026-05-12 | — | — | US | disclosed |
| US-20260125581-A1 | METHOD FOR PRODUCING POLISHING COMPOSITION CONTAINING MODIFIED POLYVINYL ALCOHOL COMPOSITION AND POLISHING COMPOSITION CONTAINING MODIFIED POLYVINYL ALCOHOL COMPOSITION | FUJIMI INCORPORATED (JP) | 2026-05-07 | — | — | US | disclosed |
| US-20260050111-A1 | OPTICAL STRUCTURE AND MANUFACTURING METHOD THEREFOR | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) | 2026-02-19 | — | — | US | disclosed |
| EP-4682939-A1 | POLISHING COMPOSITION, CONCENTRATED LIQUID OF POLISHING COMPOSITION, AND POLISHING METHOD | Fujimi Incorporated (JP) | 2026-01-21 | — | — | EP | disclosed |
| US-20250346702-A1 | COMPOSITION THAT CONTAINS COMPOUND HAVING POLYOXYALKYLENE CHAIN AND ACRYLIC COPOLYMER | RESONAC CORP (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20250297092-A1 | COMPOSITION THAT CONTAINS COMPOUND HAVING POLYOXYALKYLENE CHAIN AND ESTER-BASED THIXOTROPY-IMPARTING AGENT | RESONAC CORPORATION (JP) | 2025-09-25 | — | — | US | disclosed |
| US-12365815-B2 | Polishing liquid, polishing liquid set, polishing method, and defect suppression method | RESONAC CORPORATION (JP) | 2025-07-22 | — | — | US | disclosed |
| US-20250207030-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2025-06-26 | — | — | US | disclosed |
| CN-120202233-A | Active energy ray-curable composition and cured product | 三洋化成工业株式会社 | 2025-06-24 | — | — | CN | disclosed |
| US-20060148667-A1 | Cmp polishing compound and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| CN-1745460-A | CMP polishing slurry and polishing method | HITACHI CHEMICAL CO LTD (JP) | 2006-03-08 | — | — | CN | disclosed |
| EP-0505972-B1 | Process for producing styrenic copolymer | IDEMITSU KOSAN CO (JP) | 1997-06-11 | — | — | EP | disclosed |
| EP-0490269-B1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN CO (JP) | 1996-02-28 | — | — | EP | disclosed |
| US-5411989-A | Cardiovascular disorders | BOEHRINGER MANNHEIM, GMBH (DE) | 1995-05-02 | — | — | US | disclosed |
| US-5250629-A | Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts | IDEMITSU KOSAN CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| EP-0505972-A2 | Process for producing styrenic copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | disclosed |
| EP-0490269-A1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-06-17 | — | — | EP | disclosed |
| US-4284718-A | ADDITION POLYMERS AND A DISULFIDE COMPOUND | AGFA-GEVAERT AG (DE) | 1981-08-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12624172-B2 | Method for producing wetting agent for semiconductor, containing polyvinyl alcohol composition, polishing composition containing wetting agent for semiconductor, obtained by the production method, and method for producing polishing composition | VCL, SMARCA1, SMARCD1 | KMT2A 605/4885TET3 2434/4885FBXL19 2254/4885 |
| US-20260125581-A1 | METHOD FOR PRODUCING POLISHING COMPOSITION CONTAINING MODIFIED POLYVINYL ALCOHOL COMPOSITION AND POLISHING COMPOSITION CONTAINING MODIFIED POLYVINYL ALCOHOL COMPOSITION | RIF1, REV1, POLR1A | KMT2A 1958/4885TET3 1811/4885FBXL19 3800/4885 |
| US-20260050111-A1 | OPTICAL STRUCTURE AND MANUFACTURING METHOD THEREFOR | PGF, ZYX, PDLIM5 | KMT2A 3568/4885TET3 2680/4885FBXL19 3153/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.