SCHEMBL3741292

SCHEMBL3741292

COC(=O)C1C2CC3C(OC(=O)C31)C2OC(=O)CCCCl

nearest known ligand 0.35

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
NLRP3 Q96P20 2/20 0.35
OPRK1 P41145 5/20 0.33
OPRM1 P35372 4/20 0.33
ALDH1A1 P00352 1/20 0.31
GLA P06280 1/20 0.31
HPGD P15428 1/20 0.31
HTT P42858 1/20 0.31
OPRD1 P41143 2/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
PRKCA P17252 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1348002 0.89 NLRP3 (0.33) NLRP3PRKCA
SCHEMBL961888 0.88 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTMEN1
SCHEMBL14267002 0.87 OPRK1 (0.36) NLRP3OPRK1OPRM1ALDH1A1GLA
SCHEMBL20872225 0.86 ALDH1A1 (0.32) OPRK1OPRM1ALDH1A1GLAHPGD
SCHEMBL20872117 0.86 ALDH1A1 (0.32) OPRK1OPRM1ALDH1A1GLAHPGD
SCHEMBL12972094 0.84 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTMEN1
SCHEMBL11988736 0.84 OPRK1 (0.34) OPRK1ALDH1A1GLAHPGDHTT
SCHEMBL20872204 0.83 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTMEN1
SCHEMBL15147134 0.83 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTMEN1
SCHEMBL12009931 0.83 ALDH1A1 (0.33) ALDH1A1GLAHPGDHTTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2100887-B1 Lactone-containing compound, polymer, resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2013-07-03 EP disclosed
US-7833694-B2 Lactone-containing compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-16 US disclosed
US-7833694-B2 Lactone-containing compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-16 US disclosed
US-7833694-B2 Lactone-containing compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-16 US disclosed
US-20090233242-A1 LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
US-20090233242-A1 LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
US-20090233242-A1 LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-17 US disclosed
EP-2100887-A1 Lactone-containing compound, polymer, resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090233242-A1 LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS WDR5, RER1, H1-5 NLRP3 1662/4885OPRK1 2386/4885OPRM1 1704/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.