Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 3/20 | 0.42 |
| ▸ | PARP1 | P09874 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | LCK | P06239 | 1/20 | 0.38 |
| ▸ | FYN | P06241 | 1/20 | 0.38 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | AHR | P35869 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | GLA | P06280 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1168007 | 1.00 | GPR3 (0.42) | GPR3PARP1ALDH1A1HSD17B10CYP2A6 | |
| SCHEMBL8475292 | 0.83 | PARP1 (0.36) | GPR3PARP1ALDH1A1HSD17B10TSHR | |
| SCHEMBL3898671 | 0.76 | PARP1 (0.45) | PARP1ALDH1A1HSD17B10TSHRCYP1A2 | |
| SCHEMBL8661416 | 0.76 | PARP1 (0.50) | PARP1ALDH1A1HSD17B10TSHRCYP1A2 | |
| SCHEMBL8662857 | 0.76 | PARP1 (0.50) | PARP1ALDH1A1HSD17B10TSHRCYP1A2 | |
| SCHEMBL9246111 | 0.75 | HSP90AA1 (0.45) | PARP1ALDH1A1TSHRTDP1MAPT | |
| SCHEMBL29712878 | 0.74 | ALDH1A1 (0.37) | GPR3PARP1ALDH1A1HSD17B10CYP2A6 | |
| SCHEMBL15466319 | 0.74 | HPRT1 (0.40) | GPR3PARP1ALDH1A1HSD17B10CYP2A6 | |
| SCHEMBL2141180 | 0.74 | ALDH1A1 (0.37) | GPR3PARP1ALDH1A1HSD17B10CYP2A6 | |
| SCHEMBL5706346 | 0.73 | ALDH1A1 (0.49) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11609495-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2023-03-21 | — | — | US | claimed |
| US-20210389667-A9 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2021-12-16 | — | — | US | claimed |
| US-11117104-B2 | Composite membranes having intrinsic microporosity | IP2IPO INNOVATIONS LIMITED (GB) | 2021-09-14 | — | — | US | claimed |
| US-20210124263-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2021-04-29 | — | — | US | claimed |
| EP-2768605-B1 | MEMBRANES FOR SEPARATION | IP2IPO INNOVATIONS LTD (GB) | 2020-08-26 | — | — | EP | claimed |
| US-20200094198-A1 | COMPOSITE MEMBRANES HAVING INTRINSIC MICROPOROSITY | IP2IPO INNOVATIONS LIMITED (GB) | 2020-03-26 | — | — | US | claimed |
| US-10434479-B2 | Composite membranes having intrinsic microporosity | IP2IPO INNOVATIONS LIMITED (GB) | 2019-10-08 | — | — | US | claimed |
| US-20140251897-A1 | MEMBRANES FOR SEPARATION | IP2IPO INNOVATIONS LIMITED (GB) | 2014-09-11 | — | — | US | claimed |
| EP-2768605-A1 | MEMBRANES FOR SEPARATION | Imperial Innovations Limited (GB) | 2014-08-27 | — | — | EP | claimed |
| WO-2013057492-A1 | MEMBRANES FOR SEPARATION | IMPERIAL INNOVATIONS LIMITED (GB) | 2013-04-25 | — | — | WO | claimed |
| WO-2025234401-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2025-11-13 | — | — | WO | disclosed |
| US-20250237950-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER | JSR CORPORATION (JP) | 2025-07-24 | — | — | US | disclosed |
| US-12327835-B2 | Electrochemical cells with ionic sequestration provided by porous separators | SEPION TECHNOLOGIES, INC. (US) | 2025-06-10 | — | — | US | disclosed |
| US-20250116935-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2025-04-10 | — | — | US | disclosed |
| US-20250116922-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2025-04-10 | — | — | US | disclosed |
| US-4358620-A | 9-Formyl-9,10-dihydro-9,10-methanoanthracene | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1982-11-09 | — | — | US | disclosed |
| US-4281106-A | Heat-resistant, rigid polymers from difunctional 9,10-dihydro-9,10-ethanoanthracenes | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-07-28 | — | — | US | disclosed |
| US-4224344-A | Organic tricyclic compounds | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1980-09-23 | — | — | US | disclosed |
| EP-0014434-A1 | Right-turning basic derivative of 9,10-ethanoanthracene, process for its preparation and pharmaceutical preparations containing it | CIBA-GEIGY AG (CH) | 1980-08-20 | — | — | EP | disclosed |
| EP-0014433-A1 | Left-turning basic derivative of 9,10-ethanoanthracene, process for its preparation and pharmaceutical preparations containing it | CIBA-GEIGY AG (CH) | 1980-08-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250237950-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER | MRE11, RAD54L, VSIR | GPR3 4344/4885PARP1 97/4885ALDH1A1 2960/4885 |
| US-20210124263-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | RER1, RAD51, AFF1 | GPR3 2805/4885PARP1 212/4885ALDH1A1 1005/4885 |
| US-11609495-B2 | Radiation-sensitive resin composition and resist pattern-forming method | RER1, RAD51, AFF1 | GPR3 2805/4885PARP1 212/4885ALDH1A1 1005/4885 |
| US-20210389667-A9 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | RER1, RAD51, AFF1 | GPR3 2805/4885PARP1 212/4885ALDH1A1 1005/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.