⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3756040 | 0.89 | — | — | |
| SCHEMBL3752524 | 0.80 | — | — | |
| SCHEMBL3759034 | 0.77 | MGLL (0.30) | — | |
| SCHEMBL3751498 | 0.76 | ALDH1A1 (0.32) | — | |
| SCHEMBL3751459 | 0.69 | — | — | |
| SCHEMBL8718599 | 0.62 | CES2 (0.41) | — | |
| SCHEMBL8401122 | 0.60 | TDP1 (0.36) | — | |
| SCHEMBL8260418 | 0.59 | CYP1A2 (0.50) | — | |
| SCHEMBL14384675 | 0.59 | CYP1A2 (0.50) | — | |
| SCHEMBL8256890 | 0.59 | CYP1A2 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7837316-B2 | Correction ink for micro defect of color pattern, color filter, method for correcting micro defect of color pattern, and process for producing ink | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-11-23 | — | — | US | disclosed |
| US-7530682-B2 | Correction ink for micro defect of color pattern, color filter, method for correcting micro defect of color pattern, and process for producing ink | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20090098308-A1 | CORRECTION INK FOR MICRO DEFECT OF COLOR PATTERN, COLOR FILTER, METHOD FOR CORRECTING MICRO DEFECT OF COLOR PATTERN, AND PROCESS FOR PRODUCING INK | TAWARAYA SEIJI | 2009-04-16 | — | — | US | disclosed |