SCHEMBL3759034

SCHEMBL3759034

OC(CC1CO1)c1ccc(C=COC=Cc2ccc(C(O)CC3CO3)c(C(O)CC3CO3)c2)cc1C(O)CC1CO1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3751459 0.78
SCHEMBL3751498 0.77 ALDH1A1 (0.32)
SCHEMBL3757528 0.77
SCHEMBL3752524 0.76
SCHEMBL3756040 0.74
SCHEMBL2257702 0.66 MGLL (0.35) MGLL
SCHEMBL8718599 0.66 CES2 (0.41)
SCHEMBL7968117 0.61 MGLL (0.40) MGLL
SCHEMBL6809535 0.60 ALDH1A1 (0.35)
SCHEMBL8260418 0.60 CYP1A2 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7837316-B2 Correction ink for micro defect of color pattern, color filter, method for correcting micro defect of color pattern, and process for producing ink DAI NIPPON PRINTING CO., LTD. (JP) 2010-11-23 US disclosed
US-7530682-B2 Correction ink for micro defect of color pattern, color filter, method for correcting micro defect of color pattern, and process for producing ink DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-12 US disclosed
US-20090098308-A1 CORRECTION INK FOR MICRO DEFECT OF COLOR PATTERN, COLOR FILTER, METHOD FOR CORRECTING MICRO DEFECT OF COLOR PATTERN, AND PROCESS FOR PRODUCING INK TAWARAYA SEIJI 2009-04-16 US disclosed