Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.35 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.35 |
| ▸ | ACHE | P22303 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4585181 | 0.85 | LMNA (0.40) | ACHELMNA | |
| SCHEMBL3203332 | 0.83 | TRPA1 (0.38) | TSHRCYP1A2CYP2A6ACHELMNA | |
| SCHEMBL31072151 | 0.82 | BCHE (0.38) | CYP1A2ACHELMNAALOX12 | |
| SCHEMBL547503 | 0.82 | BCHE (0.38) | CYP1A2ACHELMNAALOX12 | |
| SCHEMBL31005100 | 0.78 | TRPA1 (0.38) | TSHRCYP1A2CYP2A6ACHELMNA | |
| SCHEMBL3182152 | 0.78 | TRPA1 (0.38) | TSHRCYP1A2CYP2A6ACHELMNA | |
| SCHEMBL423504 | 0.75 | TSHR (0.43) | TSHRCYP1A2CYP2A6ACHELMNA | |
| Bromide SCHEMBL31555343 | 0.73 | TSHR (0.41) | TSHRCYP1A2CYP2A6ACHELMNA | |
| Iodide SCHEMBL6129788 | 0.73 | TSHR (0.41) | TSHRCYP1A2CYP2A6ACHELMNA | |
| Bromide SCHEMBL3135269 | 0.73 | TSHR (0.41) | TSHRCYP1A2CYP2A6ACHELMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9034557-B2 | Chemically amplified positive photoresist composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-05-19 | — | — | US | disclosed |
| EP-2474538-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20100304299-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2010-12-02 | — | — | US | disclosed |