SCHEMBL3762386

SCHEMBL3762386

Cc1ccc([I+](OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)c2ccc(CC(C)C)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA1 P00915 10/20 0.38
CA2 P00918 10/20 0.38
MMP1 P03956 4/20 0.32
MMP2 P08253 4/20 0.32
MMP9 P14780 4/20 0.32
MMP8 P22894 4/20 0.32
MMP13 P45452 4/20 0.32
ALDH1A1 P00352 1/20 0.32
KDM4E B2RXH2 2/20 0.31
POLB P06746 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
PTGS2 P35354 1/20 0.31
ALOX5 P09917 1/20 0.30
PTGS1 P23219 1/20 0.30
TRPV1 Q8NER1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3759210 0.91 ALDH1A1 (0.34) CA1CA2ALDH1A1KDM4EPOLB
SCHEMBL2895496 0.87 CA2 (0.38) CA1CA2MMP1MMP2MMP9
SCHEMBL2897585 0.86 CA2 (0.39) CA1CA2MMP1MMP2MMP9
SCHEMBL4219797 0.82 ACHE (0.36) CA1CA2ALDH1A1
SCHEMBL5409091 0.80 CA2 (0.45) CA1CA2MMP1MMP2MMP9
SCHEMBL5401440 0.79 CA2 (0.46) CA1CA2MMP1MMP2MMP9
SCHEMBL3759052 0.79 CA1 (0.33) CA1CA2
SCHEMBL5403635 0.78 CA1 (0.35) CA1CA2MMP1MMP2MMP9
SCHEMBL5400402 0.78 CA2 (0.47) CA1CA2MMP1MMP2MMP9
SCHEMBL5422209 0.77 CA2 (0.36) CA1CA2MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070225395-A1 Thermally stable cationic photocurable compositions WOLF JEAN-PIERRE 2007-09-27 US claimed
US-20050165141-A1 Thermally stable cationic photocurable compositions CIBA SPECIALTY CHEMICALS CORP. 2005-07-28 US claimed
EP-2076563-B1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS BASF SE (DE) 2016-08-17 EP disclosed
US-8084522-B2 Thermally stable cationic photocurable compositions BASF SE (DE) 2011-12-27 US disclosed
US-20100304284-A1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS IGM GROUP B.V. (NL) 2010-12-02 US disclosed
EP-2076563-A1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS Ciba Holding Inc. (CH) 2009-07-08 EP disclosed
WO-2008049743-A1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS CIBA HOLDING INC. (CH) 2008-05-02 WO disclosed
US-20070225395-A1 Thermally stable cationic photocurable compositions WOLF JEAN-PIERRE 2007-09-27 US disclosed
EP-1709099-A2 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS Ciba Specialty Chemicals Holding Inc. (CH) 2006-10-11 EP disclosed
WO-2005070989-A2 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-08-04 WO disclosed
US-20050165141-A1 Thermally stable cationic photocurable compositions CIBA SPECIALTY CHEMICALS CORP. 2005-07-28 US disclosed
US-20010036591-A1 Iodonium salts as latent acid donors IGM GROUP B.V. (NL) 2001-11-01 US disclosed
US-6306555-B1 RADIATION-SENSITIVE COMPOSITION COMPRISING CATIONICALLY OR ACID-CATALYTICALLY POLYMERISABLE OR CROSSLINKABLE COMPOUND OR COMPOUND THAT INCREASES ITS SOLUBILITY IN DEVELOPER UNDER ACTION OF ACID, AND AT LEAST ONE DIARYLIODONIUM SALT CIBA SPECIALTY CHEMICALS CORP. 2001-10-23 US disclosed