Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | EPHX2 | P34913 | 6/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12994522 | 0.81 | L3MBTL1 (0.44) | L3MBTL1EPHX2EPHX1ALDH1A1KMT2A | |
| SCHEMBL14644904 | 0.78 | EPHX2 (0.57) | L3MBTL1EPHX2EPHX1ALDH1A1KMT2A | |
| SCHEMBL544446 | 0.76 | CYP17A1 (0.48) | ALDH1A1KMT2AMEN1MAPTSMN1; SMN2 | |
| SCHEMBL13320026 | 0.75 | LMNA (0.58) | L3MBTL1EPHX2EPHX1ALDH1A1KMT2A | |
| SCHEMBL14644923 | 0.74 | L3MBTL1 (0.52) | L3MBTL1EPHX2EPHX1ALDH1A1KMT2A | |
| SCHEMBL13320029 | 0.73 | L3MBTL1 (0.58) | L3MBTL1EPHX2EPHX1ALDH1A1KMT2A | |
| SCHEMBL29103915 | 0.73 | EPHX2 (0.55) | EPHX2EPHX1ALDH1A1KMT2AMEN1 | |
| SCHEMBL12994574 | 0.73 | L3MBTL1 (0.48) | L3MBTL1EPHX2EPHX1ALDH1A1KMT2A | |
| SCHEMBL13320019 | 0.72 | L3MBTL1 (0.57) | L3MBTL1EPHX2EPHX1ALDH1A1KMT2A | |
| SCHEMBL17348282 | 0.72 | L3MBTL1 (0.54) | L3MBTL1EPHX2EPHX1ALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8283106-B2 | Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-10-09 | — | — | US | disclosed |
| US-8283106-B2 | Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-10-09 | — | — | US | disclosed |
| US-8283106-B2 | Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-10-09 | — | — | US | disclosed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | ARF1, ARF5, ARF6 | L3MBTL1 1907/4885EPHX2 1065/4885EPHX1 1728/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.