Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 3/20 | 0.48 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | PRKCA | P17252 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 2/20 | 0.42 |
| ▸ | XBP1 | P17861 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26437516 | 0.87 | CYP17A1 (0.46) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A | |
| SCHEMBL15279135 | 0.86 | ALDH1A1 (0.50) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A | |
| SCHEMBL23719479 | 0.85 | NPSR1 (0.46) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A | |
| SCHEMBL3208886 | 0.85 | ALDH1A1 (0.53) | ALDH1A1NPSR1GAASMN1; SMN2POLB | |
| SCHEMBL2601744 | 0.83 | ALDH1A1 (0.47) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A | |
| SCHEMBL17281550 | 0.83 | ALDH1A1 (0.47) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A | |
| SCHEMBL12323914 | 0.83 | ALDH1A1 (0.47) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A | |
| SCHEMBL2625640 | 0.81 | ALDH1A1 (0.46) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A | |
| SCHEMBL14328352 | 0.80 | ALDH1A1 (0.45) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A | |
| SCHEMBL18031822 | 0.80 | PRKCA (0.48) | CYP17A1CYP19A1ALDH1A1MAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210240078-A1 | PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-08-05 | — | — | US | disclosed |
| EP-2081084-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-12-24 | — | — | EP | disclosed |
| US-8748672-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-10 | — | — | US | disclosed |
| US-8748672-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-10 | — | — | US | disclosed |
| US-8748672-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-10 | — | — | US | disclosed |
| US-20130317250-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-28 | — | — | US | disclosed |
| US-8581009-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-12 | — | — | US | disclosed |
| US-8581009-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-12 | — | — | US | disclosed |
| US-8581009-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20100119970-A1 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-20090186298-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186296-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186297-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| EP-2081083-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081085-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081084-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210240078-A1 | PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | C9, C1S, C5 | CYP17A1 3836/4885CYP19A1 1408/4885ALDH1A1 961/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | CYP17A1 2560/4885CYP19A1 1768/4885ALDH1A1 1210/4885 |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | CYP17A1 2913/4885CYP19A1 2303/4885ALDH1A1 1564/4885 |
| US-20130317250-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | PFAS, DDAH1, STS | CYP17A1 2585/4885CYP19A1 3914/4885ALDH1A1 421/4885 |
| US-20100119970-A1 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | SCO2, CA1, LCT | CYP17A1 642/4885CYP19A1 1189/4885ALDH1A1 757/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.