Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CASP6 | P55212 | 1/20 | 0.53 |
| ▸ | TPMT | P51580 | 2/20 | 0.51 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | TSHR | P16473 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | PARP1 | P09874 | 1/20 | 0.47 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.47 |
| ▸ | ERN1 | O75460 | 1/20 | 0.46 |
| ▸ | HCAR3 | P49019 | 3/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL503443 | 0.87 | CASP6 (0.62) | CASP6TPMTLMNATSHRALDH1A1 | |
| SCHEMBL6725029 | 0.82 | VCAM1 (0.56) | LMNATSHRMEN1KMT2AALDH1A1 | |
| SCHEMBL30606818 | 0.81 | TTR (0.63) | CASP6TPMTLMNATSHRMEN1 | |
| SCHEMBL644782 | 0.81 | TTR (0.63) | CASP6TPMTLMNATSHRMEN1 | |
| SCHEMBL11616525 | 0.81 | CASP6 (0.60) | CASP6TPMTLMNATSHRALDH1A1 | |
| SCHEMBL3708951 | 0.81 | LMNA (0.56) | CASP6TPMTLMNATSHRALDH1A1 | |
| SCHEMBL2720816 | 0.81 | TSHR (0.56) | CASP6TPMTLMNATSHRMEN1 | |
| SCHEMBL3353665 | 0.80 | MEN1 (0.51) | TPMTLMNAMEN1HTTKMT2A | |
| SCHEMBL4299792 | 0.80 | CASP6 (0.55) | CASP6TPMTLMNATSHRALDH1A1 | |
| SCHEMBL11803755 | 0.79 | CASP6 (0.62) | CASP6TPMTLMNATSHRMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090117493-A1 | Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-07 | — | — | US | claimed |
| CN-101268419-A | Composition for forming antireflection film containing reaction product of isocyanuric acid compound and benzoic acid compound | NISSAN CHEMICAL INDUSTRY LTD (JP) | 2008-09-17 | — | — | CN | claimed |
| EP-1939688-A1 | COMPOSITION FOR ANTIREFLECTION FILM FORMATION, COMPRISING PRODUCT OF REACTION BETWEEN ISOCYANURIC ACID COMPOUND AND BENZOIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2008-07-02 | — | — | EP | claimed |
| WO-2024176757-A1 | PROTECTIVE FILM FORMING COMPOSITION, SEMICONDUCTOR SUBSTRATE, AND ELECTRONIC COMPONENT | 日産化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-11372330-B2 | Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-06-28 | — | — | US | disclosed |
| EP-2866093-A1 | Anti-reflective coating forming composition containing vinyl ether compound and polyimide | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2015-04-29 | — | — | EP | disclosed |
| US-8501393-B2 | Lithography; photoresists; semiconductors | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| EP-2592476-A1 | Antireflective coating forming composition containing vinyl ether compound and polyimide | Nissan Chemical Industries, Ltd. (JP) | 2013-05-15 | — | — | EP | disclosed |
| US-7846638-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| US-7771929-B2 | Tag library compounds, compositions, kits and methods of use | MONOGRAM BIOSCIENCES, INC. (US) | 2010-08-10 | — | — | US | disclosed |
| US-7771929-B2 | Tag library compounds, compositions, kits and methods of use | MONOGRAM BIOSCIENCES, INC. (US) | 2010-08-10 | — | — | US | disclosed |
| US-20080138744-A1 | Anti-Reflective Coating Forming Composition Containing Vinyl Ether Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-06-12 | — | — | US | disclosed |
| EP-1278760-B1 | Methods for multiplexed determination of target species using tag library compounds, compositions and kits | ACLARA BIOSCIENCES INC (US) | 2008-06-11 | — | — | EP | disclosed |
| CN-1954265-A | Composition for forming antireflection film containing vinyl ether compound | NISSAN CHEMICAL IND LTD (JP) | 2007-04-25 | — | — | CN | disclosed |
| EP-1757987-A1 | ANTIREFLECTIVE FILM-FORMING COMPOSITION CONTAINING VINYL ETHER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20060290429-A1 | Composition form forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| CN-1723418-A | Composition for forming antireflection film for lithography | NISSAN CHEMICAL IND LTD (JP) | 2006-01-18 | — | — | CN | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-1091958-A1 | SALTS OF PAROXETINE | SMITHKLINE BEECHAM PLC (GB) | 2001-04-18 | — | — | EP | disclosed |
| WO-2000001692-A1 | SALTS OF PAROXETINE | SMITHKLINE BEECHAM PLC (GB) | 2000-01-13 | — | — | WO | disclosed |