Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 3/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 2/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | CA6 | P23280 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL377162 | 0.92 | CA1 (0.34) | HPGDALOX15HSD17B10MAPTTSHR | |
| SCHEMBL28564570 | 0.80 | CES2 (0.47) | HPGDALOX15MAPTMEN1KMT2A | |
| SCHEMBL9367082 | 0.79 | NR4A1 (0.51) | HPGDMAPTMEN1KMT2AGAA | |
| SCHEMBL777725 | 0.79 | NPC1 (0.45) | HPGDMAPTMEN1KMT2ALMNA | |
| SCHEMBL6638516 | 0.75 | LMNA (0.50) | ALOX15HSD17B10MAPTTSHRMEN1 | |
| SCHEMBL28006418 | 0.73 | ALOX15 (0.42) | HPGDALOX15HSD17B10TSHRMEN1 | |
| SCHEMBL21408400 | 0.73 | ATM (0.41) | MAPTLMNASDHBTDP1CES1 | |
| SCHEMBL28421364 | 0.71 | IRAK4 (0.37) | HPGDHSD17B10MAPTTSHRMEN1 | |
| SCHEMBL28573797 | 0.70 | PDCD1 (0.49) | MAPTKDM4ECA1CA2CA9 | |
| SCHEMBL28365571 | 0.70 | MAPT (0.37) | HPGDMAPTTSHRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 232 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6274286-B1 | Resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-14 | — | — | US | claimed |
| WO-1993009474-A1 | PHOTOELECTROGRAPHIC ELEMENTS UTILIZING NONIONIC SULFONIC ACID PHOTOGENERATORS | EASTMAN KODAK COMPANY (US) | 1993-05-13 | — | — | WO | claimed |
| US-5204198-A | Consistent performance at variable relative humidities | EASTMAN KODAK COMPANY (US) | 1993-04-20 | — | — | US | claimed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| CN-119179233-A | Photosensitive composition, method for producing pattern, cured product, and electronic component | 江苏艾森半导体材料股份有限公司 | 2024-12-24 | — | — | CN | disclosed |
| US-20240210831-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| EP-4386037-A1 | SILPHENYLENE-SKELETON-CONTAINING POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING OPTICAL SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-19 | — | — | EP | disclosed |
| EP-3656803-B1 | POLYSILOXANE SKELETON POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING PROCESS, AND FABRICATION OF OPTO-SEMICONDUCTOR DEVICE | SHINETSU CHEMICAL CO (JP) | 2024-04-10 | — | — | EP | disclosed |
| CN-111381447-B | Photosensitive resin composition, laminate, and pattern forming method | 信越化学工业株式会社 | 2024-03-08 | — | — | CN | disclosed |
| EP-4321553-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-14 | — | — | EP | disclosed |
| EP-3441818-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHOTOSENSITIVE DRY FILM, LAMINATE, AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2023-12-06 | — | — | EP | disclosed |
| US-6156481-A | WITH HYDROXYSTYRENE-(METH)ACRYLIC ACID OR (METH)ACRYLATE COPOLYMER WHERE SOME PHENOLIC HYDROXYL GROUPS ARE CROSSLINKED WITH ETHER CONTAINING ACID LABILE GROUPS; DISSOLUTION INHIBITION AND INCREASED DISSOLUTION CONTRAST AFTER EXPOSURE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-12-05 | — | — | US | disclosed |
| US-6136502-A | COMPRISING ORGANIC SOLVENT, AT LEAST TWO POLYMERS WITH WEIGHT AVERAGE MOLECULAR WEIGHTS OF 1,000-500,000 WHICH HAVE AT LEAST ONE TYPE OF ACID LABILE GROUP AND ARE CROSSLINKED WITHIN A MOLECULE AND/OR BETWEEN MOLECULES, PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-1039346-A1 | Resist compositions and pattering process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-27 | — | — | EP | disclosed |
| US-6117621-A | APPLYING A CHEMICALLY AMPLIFIED POSITIVE RESIST OF A POLYMER WITH ACID LABILE GROUPS, A PHOTOACID GENERATOR AND A ORGANIC SOLVENT; RESOLUTION AND FOCAL DEPTH; EXPOSING, BAKING, AND DEVELOPING; CALIBRATION OF EXPOSURES AND DISSOLUTION RATES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-12 | — | — | US | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0887705-A1 | Resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-30 | — | — | EP | disclosed |
| WO-1993009474-A1 | PHOTOELECTROGRAPHIC ELEMENTS UTILIZING NONIONIC SULFONIC ACID PHOTOGENERATORS | EASTMAN KODAK COMPANY (US) | 1993-05-13 | — | — | WO | disclosed |
| US-5204198-A | Consistent performance at variable relative humidities | EASTMAN KODAK COMPANY (US) | 1993-04-20 | — | — | US | disclosed |