Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RELA | Q04206 | 1/20 | 0.43 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.38 |
| ▸ | MAOB | P27338 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | THPO | P40225 | 1/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | MTOR | P42345 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 2/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | GMNN | O75496 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Itaconate SCHEMBL7683801 | 0.82 | EGFR (0.38) | MAOBRAB9ACYP2C19ALDH1A1SMN1; SMN2 | |
| SCHEMBL3801957 | 0.81 | IDO1 (0.43) | RELATRPA1RAB9AIDO1MEN1 | |
| SCHEMBL5348553 | 0.81 | EGFR (0.42) | RELASMN1; SMN2LMNATP53MAPT | |
| SCHEMBL187273 | 0.79 | MAOB (0.44) | RELATRPA1MAOBCYP3A4CYP1A2 | |
| SCHEMBL7770617 | 0.79 | MAOB (0.44) | RELATRPA1MAOBCYP3A4CYP1A2 | |
| SCHEMBL27620991 | 0.78 | RELA (0.44) | RELATRPA1MAOBCYP3A4CYP1A2 | |
| SCHEMBL9128813 | 0.75 | CYP2C19 (0.41) | RELAMAOBCYP1A2RAB9ACYP2C19 | |
| SCHEMBL28560204 | 0.74 | MAPK1 (0.50) | RELATRPA1MAOBCYP3A4CYP2C19 | |
| SCHEMBL27619274 | 0.74 | TRPA1 (0.44) | RELATRPA1MAOBCYP3A4CYP1A2 | |
| SCHEMBL15321833 | 0.74 | ALDH1A1 (0.41) | RELATRPA1MAOBCYP3A4CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8357750-B2 | Adhesive composition and film adhesive | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-22 | — | — | US | claimed |
| US-20100331477-A1 | ADHESIVE COMPOSITION AND FILM ADHESIVE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-30 | — | — | US | claimed |
| US-10126649-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-11-13 | — | — | US | disclosed |
| US-20180211828-A1 | COMPOSITION FOR FORMING FILM FOR USE IN CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE | JSR CORPORATION (JP) | 2018-07-26 | — | — | US | disclosed |
| US-20180024435-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-9335632-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-10 | — | — | US | disclosed |
| US-9244350-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-9063413-B2 | Resist composition, patterning process, monomer, and copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9052593-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20150064626-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-05 | — | — | US | disclosed |
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-6869748-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | disclosed |
| US-20040023153-A1 | Resist compostion and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |
| EP-1378795-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-01-07 | — | — | EP | disclosed |
| US-20030118934-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-26 | — | — | US | disclosed |
| US-20030118934-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-26 | — | — | US | disclosed |
| JP-2003146927-A | METHOD FOR PRODUCING tert-AMYLOXYSTYRENE | HOKKO CHEM IND CO LTD | 2003-05-21 | — | — | JP | disclosed |
| JP-2003131384-A | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN ETSU CHEM CO LTD | 2003-05-09 | — | — | JP | disclosed |
| EP-1308782-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-07 | — | — | EP | disclosed |
| EP-1308782-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-07 | — | — | EP | disclosed |