SCHEMBL3784849

SCHEMBL3784849

CCCCCCCCCCCCCCCCCCOP(=O)([O-])[O-].[Ca+2]

nearest known ligand 0.59

Known targets — ChEMBL curated mechanism

GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHMGCRMMP1MMP13MMP7MMP8PTGS1PTGS2ileSpolrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LPAR3 Q9UBY5 8/20 0.59
▸ LPAR2 Q9HBW0 6/20 0.59
▸ LPAR1 Q92633 3/20 0.59
▸ AKT1 P31749 2/20 0.56
▸ CDC25A P30304 2/20 0.56
▸ LMNA P02545 1/20 0.56
▸ ESR1 P03372 1/20 0.56
▸ ADORA3 P0DMS8 1/20 0.56
▸ AGTR1 P30556 1/20 0.56
▸ ADRA1A P35348 1/20 0.56
▸ KCNH2 Q12809 1/20 0.56
▸ CYP3A4 P08684 1/20 0.50
▸ RECQL P46063 2/20 0.47
▸ GLA P06280 1/20 0.47
▸ HPGD P15428 1/20 0.47
▸ TSHR P16473 1/20 0.47
▸ MAPK1 P28482 1/20 0.47
▸ EPHX2 P34913 1/20 0.47
▸ BLM P54132 1/20 0.47
▸ TERT O14746 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphoric Acid Monodecyl Ester SCHEMBL28359660 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
SCHEMBL28359607 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
Hexadecyl Dihydrogen Phosphate SCHEMBL5680624 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
SCHEMBL28355333 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
Phosphoric Acid Monododecyl Ester SCHEMBL3893034 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
Hexadecyl Dihydrogen Phosphate SCHEMBL483790 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
SCHEMBL11255117 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
SCHEMBL28359340 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
SCHEMBL28359276 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A
Phosphoric Acid Monotetradecyl Ester SCHEMBL28355509 1.00 LPAR3 (0.59) LPAR3LPAR2LPAR1AKT1CDC25A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114524896-B Preparation method of surface fold microsphere 南京亘闪生物科技有限公司 2024-05-24 — — CN claimed
CN-114524896-A Preparation method of microsphere with wrinkled surface 南京亘闪生物科技有限公司 2022-05-24 — — CN claimed
CN-114524896-B Preparation method of surface fold microsphere 南京亘闪生物科技有限公司 2024-05-24 — — CN disclosed
CN-114524896-A Preparation method of microsphere with wrinkled surface 南京亘闪生物科技有限公司 2022-05-24 — — CN disclosed
CN-110791964-B Treating agent for elastic fiber and elastic fiber 竹本油脂株式会社 2020-10-23 — — CN disclosed
CN-110791964-A Treating agent for elastic fiber and elastic fiber 竹本油脂株式会社 2020-02-14 — — CN disclosed
EP-2223950-B1 ALIPHATIC POLYESTER RESIN AND METHOD FOR PRODUCING THE SAME MITSUBISHI CHEM CORP (JP) 2018-03-07 — — EP disclosed
US-8969507-B2 Aliphatic polyester resin and its production method MITSUBISHI CHEMICAL CORPORATION (JP) 2015-03-03 — — US disclosed
US-20130066038-A1 ALIPHATIC POLYESTER RESIN AND ITS PRODUCTION METHOD MITSUBISHI CHEMICAL CORPORATION (JP) 2013-03-14 — — US disclosed
US-8318893-B2 Aliphatic polyester resin and its production method MITSUBISHI CHEMICAL CORPORATION (JP) 2012-11-27 — — US disclosed
CN-101896533-B Aliphatic polyester resin and process for producing the same MITSUBISHI CHEM CORP 2012-08-22 — — CN disclosed
US-4824593-A MATRIX OF FATTY ACID AND SOAP LEVER BROTHERS COMPANY (US) 1989-04-25 — — US disclosed
EP-0120981-B1 RESIN ENCAPSULATION TYPE SEMICONDUCTOR DEVICE KABUSHIKI KAISHA TOSHIBA (JP) 1988-10-12 — — EP disclosed
EP-0266863-A1 Antifoam ingredient UNILEVER PLC (GB) 1988-05-11 — — EP disclosed
EP-0256833-A2 Antifoam ingredient UNILEVER PLC (GB) 1988-02-24 — — EP disclosed
US-4617584-A GOOD HUMIDITY RESISTANCE, CORROSION RESITANCE; CURED NOVOLAC TYPE EPOXY RESIN, NOVOLAC PHENOLIC RESIN AND ORGANIC PHOSPHOROUS COMPOUND TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) 1986-10-14 — — US disclosed
EP-0139931-A2 Process for neutralizing halogens and acids released in the processing of polymers THE DOW CHEMICAL COMPANY (US) 1985-05-08 — — EP disclosed
EP-0139930-A1 Process for deactivating and neutralizing polymerization catalysts THE DOW CHEMICAL COMPANY (US) 1985-05-08 — — EP disclosed
EP-0120981-A1 Resin encapsulation type semiconductor device KABUSHIKI KAISHA TOSHIBA (JP) 1984-10-10 — — EP disclosed
US-4163018-A REACTING AN ALKYL PHOSPHATE WITH A GROUP 2A, ZINC, OR ALUMINUM HALIDE, NITRATE, OR SULFATE SAKAI CHEMICAL INDUSTRY COMPANY, LTD. (JP) 1979-07-31 — — US disclosed
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