Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PSEN1 | P49768 | 1/20 | 0.34 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.34 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.34 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.34 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.34 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.34 |
| ▸ | ENPP3 | O14638 | 2/20 | 0.33 |
| ▸ | ENPP1 | P22413 | 2/20 | 0.33 |
| ▸ | FABP3 | P05413 | 1/20 | 0.33 |
| ▸ | FABP4 | P15090 | 1/20 | 0.33 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3778770 | 0.89 | FABP3 (0.32) | ENPP3ENPP1FABP3FABP4FABP5 | |
| SCHEMBL383991 | 0.82 | FABP4 (0.47) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL3785667 | 0.82 | PSEN1 (0.36) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL5549719 | 0.80 | FABP4 (0.37) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL2569744 | 0.80 | CYP1A2 (0.33) | — | |
| Cyclohexane SCHEMBL2574992 | 0.79 | LTB4R (0.31) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2572040 | 0.79 | GPR3 (0.31) | — | |
| SCHEMBL5549805 | 0.79 | FABP4 (0.42) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL3780561 | 0.78 | FABP4 (0.44) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL547282 | 0.76 | FABP4 (0.39) | PSEN1PSEN2APH1BNCSTNAPH1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7858287-B2 | Photosensitive resin, and photosensitive composition | HYOGO PREFECTURE (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20090142697-A1 | PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION | TOYO GOSEI CO., LTD. (JP) | 2009-06-04 | — | — | US | disclosed |