SCHEMBL3801410

SCHEMBL3801410

C=C(C)C(=O)OCCC[Si](O)(O)OC

nearest known ligand 0.53

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.53
THRB P10828 1/20 0.46
POLB P06746 1/20 0.41
APEX1 P27695 1/20 0.41
HTT P42858 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
ALDH1A1 P00352 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29670657 0.87 TSHR (0.55) TSHRTHRBPOLBAPEX1HTT
SCHEMBL3796581 0.86 TSHR (0.53) TSHRTHRBPOLBAPEX1HTT
SCHEMBL12095074 0.85 TSHR (0.60) TSHRTHRBPOLBAPEX1HTT
SCHEMBL17480218 0.84 TSHR (0.51) TSHRTHRBPOLBAPEX1HTT
SCHEMBL27928443 0.84 TSHR (0.51) TSHRTHRBPOLBAPEX1HTT
SCHEMBL15276 0.84 TSHR (0.55) TSHRTHRBPOLBAPEX1HTT
SCHEMBL845749 0.84 TSHR (0.55) TSHRTHRBPOLBAPEX1HTT
SCHEMBL5446210 0.84 TSHR (0.55) TSHRTHRBPOLBAPEX1HTT
SCHEMBL845108 0.84 TSHR (0.55) TSHRTHRBPOLBAPEX1HTT
SCHEMBL35128 0.84 TSHR (0.55) TSHRTHRBPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108602955-B Photocuring method, compound used in photocuring method, and composition 富士胶片和光纯药株式会社 2021-08-06 CN disclosed
US-10774062-B2 Photocuring method, compound and composition used therein FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2020-09-15 US disclosed
EP-3409709-B1 PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
US-20190055210-A1 PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-02-21 US disclosed
EP-3409709-A1 PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN FUJIFILM Wako Pure Chemical Corporation (JP) 2018-12-05 EP disclosed
US-20170267703-A1 METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-21 US disclosed
US-9751901-B2 Method for preparing a polyorganosiloxane and a polyorganosiloxane SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-05 US disclosed
US-20170088566-A1 METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-30 US disclosed
US-20160159827-A1 METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE SHINETSU CHEMICAL CO (JP) 2016-06-09 US disclosed
US-9340649-B2 Method for preparing a polyorganosiloxane and a polyorganosiloxane SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-05-17 US disclosed
US-8956839-B2 Thiol-ene coupling chemistry for immobilization of biocatalysts AKERMIN, INC. (US) 2015-02-17 US disclosed
US-20140213809-A1 METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-31 US disclosed
US-8530545-B2 Copolymers of nanoparticles, vinyl monomers and silicone 3M INNOVATIVE PROPERTIES COMPANY (US) 2013-09-10 US disclosed
US-8492496-B2 Copolymers of nanoparticles, vinyl monomers and silicone 3M INNOVATIVE PROPERTIES COMPANY (US) 2013-07-23 US disclosed
US-20100323570-A1 COPOLYMERS OF NANOPARTICLES, VINYL MONOMERS AND SILICONE 3M INNOVATIVE PROPERTIES COMPANY 2010-12-23 US disclosed
US-20100310865-A1 COPOLYMERS OF NANOPARTICLES, VINYL MONOMERS AND SILICONE 3M INNOVATIVE PROPERTIES COMPANY 2010-12-09 US disclosed
US-7737187-B2 Process for producing inorganic oxide organosol NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-06-15 US disclosed
EP-1544257-B1 Process for producing inorganic oxide organosol NISSAN CHEMICAL IND LTD (JP) 2007-08-22 EP disclosed
US-20050154124-A1 Process for producing inorganic oxide organosol NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-07-14 US disclosed
EP-1544257-A2 Process for producing inorganic oxide organosol NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 2005-06-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160159827-A1 METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE SCO2, HAO2, RIOX2 TSHR 1922/4885THRB 2762/4885POLB 1015/4885
US-20170088566-A1 METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE SCO2, HAO2, RPS4X TSHR 1832/4885THRB 2777/4885POLB 977/4885
US-20170267703-A1 METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE SCO2, HAO2, RIOX2 TSHR 1922/4885THRB 2762/4885POLB 1015/4885
US-20140213809-A1 METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE SCO2, IPO4, HAO2 TSHR 3714/4885THRB 3336/4885POLB 317/4885
US-20190055210-A1 PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN ESD, TMT1A, PAM TSHR 4741/4885THRB 4497/4885POLB 272/4885
US-10774062-B2 Photocuring method, compound and composition used therein ESD, TMT1A, PAM TSHR 4741/4885THRB 4497/4885POLB 272/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.