SCHEMBL3840557

SCHEMBL3840557

Ic1cccc(Oc2ccccc2Oc2cccc(I)c2)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.44
ALDH1A1 P00352 3/20 0.44
MAPK1 P28482 1/20 0.41
HTT P42858 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
SLC6A2 P23975 3/20 0.40
SLC6A4 P31645 3/20 0.40
SLC6A3 Q01959 3/20 0.40
AKR1C3 P42330 1/20 0.39
MAOB P27338 1/20 0.39
RCE1 Q9Y256 1/20 0.38
KMT2A Q03164 2/20 0.36
IDO1 P14902 1/20 0.36
F10 P00742 1/20 0.36
LMNA P02545 1/20 0.36
HTR1A P08908 1/20 0.36
DPP4 P27487 1/20 0.36
LTA4H P09960 1/20 0.36
TSHR P16473 1/20 0.36
MEN1 O00255 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22181175 0.86 AR (0.46) GAAALDH1A1KMT2ATSHRMEN1
SCHEMBL3841098 0.85 ALDH1A1 (0.46) GAAALDH1A1SLC6A2SLC6A4SLC6A3
SCHEMBL30148759 0.85 ALDH1A1 (0.46) GAAALDH1A1SLC6A2SLC6A4SLC6A3
SCHEMBL7560564 0.84 LTA4H (0.57) GAAALDH1A1AKR1C3MAOBKMT2A
SCHEMBL3845360 0.83 SMN1; SMN2 (0.50) GAAALDH1A1SLC6A2SLC6A4SLC6A3
SCHEMBL7771820 0.83 SLC6A4 (0.44) GAAALDH1A1SLC6A2SLC6A4SLC6A3
SCHEMBL22868020 0.82 POLB (0.54) GAAALDH1A1SMN1; SMN2
SCHEMBL3842596 0.82 CTNNB1 (0.49) ALDH1A1L3MBTL1AKR1C3KMT2AF10
SCHEMBL3839195 0.81 ALDH1A1 (0.54) GAAALDH1A1SLC6A2SLC6A4SLC6A3
SCHEMBL3839098 0.81 ALDH1A1 (0.54) GAAALDH1A1SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6884862-B2 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2005-04-26 US claimed
US-7556860-B2 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2009-07-07 US disclosed
EP-1245638-B1 Composition for insulating film formation JSR CORP (JP) 2009-01-14 EP disclosed
EP-1298176-B1 Stacked film insulating film and substrate for semiconductor JSR CORP (JP) 2007-01-03 EP disclosed
US-20060216531-A1 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2006-09-28 US disclosed
US-20060210812-A1 Insulating film and method of forming the same JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1696478-A1 INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-08-30 EP disclosed
EP-1679184-A1 LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-07-12 EP disclosed
US-6884862-B2 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2005-04-26 US disclosed
US-6852370-B2 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2005-02-08 US disclosed
US-6824833-B2 STACKED DIELECTRIC JSR CORPORATION (JP) 2004-11-30 US disclosed
EP-1254917-B1 Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film JSR CORP (JP) 2004-06-30 EP disclosed
US-20030077461-A1 Stacked film, insulating film and substrate for semiconductor JSR CORPORATION (JP) 2003-04-24 US disclosed
EP-1298176-A2 Stacked film insulating film and substrate for semiconductor JSR Corporation (JP) 2003-04-02 EP disclosed
EP-1254917-A1 Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film JSR Corporation (JP) 2002-11-06 EP disclosed
US-20020161173-A1 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2002-10-31 US disclosed
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed